Research on robust and reliable RF-MEMS switch using conductive soft material
Research on robust and reliable RF-MEMS switch using conductive soft material
批准号:
22710119
负责人:
YOSHIDA Shinya
金额:
$2.66万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011
中文摘要
本研究对一种导电软材料的柔韧性和力学性能进行了评价,以探讨其在RF-MEMS开关中应用的可能性。此外,还开发了提高腐蚀损伤单晶硅断裂强度的工艺技术。结果,作为导电聚合物的聚苯胺膜的杨氏模数约为5 Gpa,与金属的粘附力被评估为相对较低。此外,还证明了在适当的条件下进行氢退火可以使硅表面的粗糙度因腐蚀损伤而变得平坦。
英文摘要
In this study, the flexibility and mechanical property of a conductive soft material was evaluated in order to investigate its application possibility to RF-MEMS switch. In addition, process technology for improvement of fracture strength of the single crystal silicon which was damaged by etching process was developed. As a result, Young's modulus of a thin polyaniline film as a conductive polymer measured approximately 5 GPa, and the adhesion force to metals was evaluated to be relatively low. Furthermore, it was demonstrated that hydrogen annealing in appropriate condition can lead to flattening of the asperity of the silicon surface due to etching damage.
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Deposition of conductivity-switching polyimide film by molecular layer deposition and electrical modification using scanning probe microscope
使用扫描探针显微镜通过分子层沉积和电改性沉积电导率切换聚酰亚胺薄膜
DOI:
--
发表时间:
2010
期刊:
Micro & Nano Letters
影响因子:
1.3
作者:
[Shinya Yoshida, Takahito Ono, Masayoshi Esashi]
通讯作者:
Masayoshi Esashi
MEMS用難除去性高分子材料の高速除去のための蒸気オゾンエッチング装置の開発
开发用于MEMS难去除高分子材料高速去除的蒸汽臭氧蚀刻设备
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[原島卓也, 吉田慎哉, 江刺正喜, 田中秀治]
通讯作者:
田中秀治
Conformal Coating of Lithographic Polymer on 3D Structure via Initiated Chemical Vapor Deposition for MEMS fabrication
通过引发化学气相沉积在 3D 结构上进行光刻聚合物保形涂层,用于 MEMS 制造
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[Shinya Yoshida, Tatsuya Kobayashi, Masafumi Kumano, and Masayoshi Esashi]
通讯作者:
and Masayoshi Esashi
面内方向駆動型圧電MEMSスイッチのためのSi 鋳型を用いた高アスペクト比PZT構造体の作製法の開発
使用硅模具开发高纵横比 PZT 结构的制造方法,用于面内方向驱动压电 MEMS 开关
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[王楠, 吉田慎哉, 熊野勝文, 江刺正喜]
通讯作者:
江刺正喜
Deposition of a conductivity-switching polyimide film by molecular layer deposition and electrical modification using scanning probe microscope
使用扫描探针显微镜通过分子层沉积和电改性沉积电导率切换聚酰亚胺薄膜
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[Shinya Yoshida, Takahito Ono, Masayoshi Esashi]
通讯作者:
Masayoshi Esashi
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批准号:15K00919
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批准号:20860005
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负责人:YOSHIDA Shinya
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A study of External Activation Slips by Repeated Naturalistic Observation
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批准号:13610151
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项目类别:Grant-in-Aid for Scientific Research (C)
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负责人:YOSHIDA Shinya
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依托单位: