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Growth of highly oriented h-BN single crystal by chemical vapor deposition method

Growth of highly oriented h-BN single crystal by chemical vapor deposition method
化学气相沉积法生长高取向h-BN单晶
批准号:
23310096
负责人:
WATANABE Kenji
金额:
$11.9万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011-04-01 至 2014-03-31

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中文摘要
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英文摘要
Hexagonal boron nitride (h-BN), which has a 2D-plane layered structure composed of nitrogen and boron atoms in sp2 bonding, is a proven and effective substrate for atomic layer materials including graphene, because it has an atomically smooth surface that is relatively free of dangling bonds and charge traps.However, to realize atomic layer devices, the single-crystalline growth technique for hBN is of great importance. In this study, we achieved high quality h-BN homoepitaxial growth on the bulk h-BN substrate by employing chemical vapor deposition methods with high-growth temperature.
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Synthesis of high purity hBN single crystals by using solvent growth p rocess
溶剂生长法合成高纯度六方氮化硼单晶
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影响因子: --
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六方氮化硼单晶粉末的激子荧光
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影响因子: --
作者: [佐藤慎一, 石川冬樹, 猪原健弘, 渡邊賢司, 横山壽一, Kenji Watanabe]
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