Growth of highly oriented h-BN single crystal by chemical vapor deposition method
Growth of highly oriented h-BN single crystal by chemical vapor deposition method
批准号:
23310096
负责人:
WATANABE Kenji
金额:
$11.9万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011-04-01 至 2014-03-31
中文摘要
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英文摘要
Hexagonal boron nitride (h-BN), which has a 2D-plane layered structure composed of nitrogen and boron atoms in sp2 bonding, is a proven and effective substrate for atomic layer materials including graphene, because it has an atomically smooth surface that is relatively free of dangling bonds and charge traps.However, to realize atomic layer devices, the single-crystalline growth technique for hBN is of great importance. In this study, we achieved high quality h-BN homoepitaxial growth on the bulk h-BN substrate by employing chemical vapor deposition methods with high-growth temperature.
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DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[谷口尚, 渡邊賢司]
通讯作者:
渡邊賢司
Excitonic fluorescence for hBN single-crystal powder
六方氮化硼单晶粉末的激子荧光
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[佐藤慎一, 石川冬樹, 猪原健弘, 渡邊賢司, 横山壽一, Kenji Watanabe]
通讯作者:
Kenji Watanabe
サイエンス誌に載った日本人研究者2013、2次元的物質との1次元的電気接触
日本研究人员2013年在《科学》杂志上发表一维与二维材料的电接触
DOI:
--
发表时间:
2014
期刊:
影响因子:
--
作者:
[渡邊賢司, 谷口尚]
通讯作者:
谷口尚
高圧合成法による高純度窒化ホウ素単結晶研究の現状と新しい応用展開
高压合成法高纯氮化硼单晶研究现状及新应用进展
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[K. Shinozaki, T. Honma, T. Komatsu, 渡邊賢司]
通讯作者:
渡邊賢司
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[Zhang Y., Sharma P., Makino A., K.Watanabe]
通讯作者:
K.Watanabe
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