Stability of surface contact for hexagonal boron nitride atomic layer
Stability of surface contact for hexagonal boron nitride atomic layer
批准号:
24651148
负责人:
WATANABE Kenji
金额:
$2.58万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012-04-01 至 2014-03-31
中文摘要
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英文摘要
Hexagonal boron nitride (h-BN) is an insulator which has a 2D-plane crystalline structure composed of nitrogen and boron atoms in sp2 bonding and which shows intense emission in the UV region. To realize the impurity doping for the control of electrical conduction, we studied the stability of both h-BN bulk crystals and atomic layers at high temperature up to 1300 degrees Celsius by employing a micro-Raman spectrograph system with a high temperature furnace. Single layer h-BN starts to oxidize at 700 degrees Celsius and can keep up at the temperature up to 850 degrees Celsius. Bilayer and trilayer BN nanosheets have slightly higher temperatures for oxidation, but the bulk crystals show the stable Raman spectra up to 1300 degrees Celsius.
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DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[谷口尚, 渡邊賢司]
通讯作者:
渡邊賢司
グラフェンの特性を活かす六方晶窒化ホウ素基板~六方晶窒化ホウ素応用の進展開~NEW DIAMOND(Vol.104,No.1)
利用石墨烯特性的六方氮化硼基板 - 六方氮化硼的应用进展 - NEW DIAMOND (Vol.104, No.1)
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[渡邊賢司, 谷口尚]
通讯作者:
谷口尚
Gate Dependent Raman Spectroscopy of Graphene on Hexagonal Boron Nitride
六方氮化硼上石墨烯的门相关拉曼光谱
DOI:
10.1088/0953-8984/25/50/505304
发表时间:
2013
期刊:
J. Phys. : Condens. Matter
影响因子:
--
作者:
[C. Kanokporn, K. Watanabe, T. Taniguchi 他3名]
通讯作者:
T. Taniguchi 他3名
高温高圧法により育成した六方晶窒化ホウ素単結晶劈開面のカソードルミネッセンス像観察
高温高压法生长六方氮化硼单晶解理面的阴极发光图像观察
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[M. Kalbac, K. Watanabe, T. Taniguchi 他5名, 渡邊賢司, 渡邊賢司]
通讯作者:
渡邊賢司
サイエンス誌に載った日本人研究者2011、六方晶窒化ホウ素基板により新しいグラフェンの特性を発見
日本研究人员在2011年《科学》杂志上发表文章,利用六方氮化硼基底发现石墨烯的新特性
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[渡邊賢司, 谷口尚]
通讯作者:
谷口尚
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