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Stability of surface contact for hexagonal boron nitride atomic layer

Stability of surface contact for hexagonal boron nitride atomic layer
六方氮化硼原子层表面接触稳定性
批准号:
24651148
负责人:
WATANABE Kenji
金额:
$2.58万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012-04-01 至 2014-03-31

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中文摘要
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英文摘要
Hexagonal boron nitride (h-BN) is an insulator which has a 2D-plane crystalline structure composed of nitrogen and boron atoms in sp2 bonding and which shows intense emission in the UV region. To realize the impurity doping for the control of electrical conduction, we studied the stability of both h-BN bulk crystals and atomic layers at high temperature up to 1300 degrees Celsius by employing a micro-Raman spectrograph system with a high temperature furnace. Single layer h-BN starts to oxidize at 700 degrees Celsius and can keep up at the temperature up to 850 degrees Celsius. Bilayer and trilayer BN nanosheets have slightly higher temperatures for oxidation, but the bulk crystals show the stable Raman spectra up to 1300 degrees Celsius.
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Synthesis of high purity hBN single crystals by using solvent growth p rocess
溶剂生长法合成高纯度六方氮化硼单晶
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [谷口尚, 渡邊賢司]
通讯作者: 渡邊賢司
グラフェンの特性を活かす六方晶窒化ホウ素基板~六方晶窒化ホウ素応用の進展開~NEW DIAMOND(Vol.104,No.1)
利用石墨烯特性的六方氮化硼基板 - 六方氮化硼的应用进展 - NEW DIAMOND (Vol.104, No.1)
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [渡邊賢司, 谷口尚]
通讯作者: 谷口尚
Gate Dependent Raman Spectroscopy of Graphene on Hexagonal Boron Nitride
六方氮化硼上石墨烯的门相关拉曼光谱
DOI: 10.1088/0953-8984/25/50/505304
发表时间: 2013
期刊: J. Phys. : Condens. Matter
影响因子: --
作者: [C. Kanokporn, K. Watanabe, T. Taniguchi 他3名]
通讯作者: T. Taniguchi 他3名
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [M. Kalbac, K. Watanabe, T. Taniguchi 他5名, 渡邊賢司, 渡邊賢司]
通讯作者: 渡邊賢司
33
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