Development of Total reflection zone plate for hard x-ray nanofocusing

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We developed "Total-reflection zone plate" which has higher potential ability in x-ray focusing with easier fabrication than general x-ray focusing devices. In line-focusing type for on-dimensional focusing, devices with the theoretical focusing size better than 5 nm were designed and fabricated. And it achieved x-ray focusing with the size better than 20 nm and with higher efficiency than we previously developed. A point focusing with the size better than 50 nm also could be obtained by using two line-focusing type devices arranged in tandem. We proposed other two-dimensional focusing devices as point-focusing type. The high potential abilities in x-ray focusing were revealed using calculation studies. The fabrication process for the point-focusing type was studied. Finally, a prototype device using a partial cylindrical substrate was successfully fabricated.