Study on nano machining technology using fullerenol molecules

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Novel functional fine particles are formed by mixing fullerenol solution and colloidal silica slurry for applying sapphire CMP. Material removal rate (MRR) of the sapphire CMP become higher than conventional colloidal silica slurry by using novel functional fine particles. In this cases, the MRR increases as the concentration of the C60(OH)n in the mixed slurry become higher. The variation of MRR against concentration of the C60(OH)n is effected by surface morphology of the sapphire substrate in this case.The fullerenol molecules such as C60(OH)n n=ca.10 are adsorbed on the colloidal silica particles for the fine particle by DLS and Raman results. From the peak shift of the DLS, we estimate that 2 layers of C60(OH)n molecules is coated around the colloidal silica particles. C60(OH)n molecules might be weakly bonded with the colloidal silica particle because the peak assigned as C60(OH)n molecules shift by the adsorption process on the Raman spectra.