Development of bridged nitride semiconductor nanowire LED on Si substrate

点击翻译按钮获取中文摘要

We succeeded in growth of GaN nanowires (NWs) on trench wall of Si microstructure. In order to reduce adverse effects of a polarization electric fieldand buffer layers, we also succeeded in growth of InGaN NWs on Si substrate without any buffer layer. In contrast to GaN NWs, however, there are some twin boundaries in InGaN NWs. We investigated the relationship between the twin boundaries and the optical properties. Lastly, we attempted to grow GaN NWs on highly oriented pyrolytic graphite(HOPG) substrate in order to apply to future device, and we observed that GaN NWs grew on HOPG substrate.