Heteroepitaxy of III-nitride thin films with ultra low defect density
Heteroepitaxy of III-nitride thin films with ultra low defect density
批准号:
23656020
负责人:
TANAKA Satoru
金额:
$2.5万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012
中文摘要
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英文摘要
In-situRHEED and AFM at the initial growth stages indicate nucleation of 6H-GaN at the nanofacets followed by step-flow towards the vicinal direction [1-100] of the substrate. No nuclei on the terraces, generally resulting in 2H-polytype, are observed. Continuous growth under the same condition gives a ~50nm-thick GaN film to be analyzed by Raman and PL. Clear two zone-folded phonon modes are observed between E1(TO) and E2(high), which is indicative of the formation of 6H-polytype. The PL spectrum indicates different energy transitions from 2H-GaN: a peak at 3.33eV is shifted by -0.13eV, which also supports the formation of the 6H-polytype. This is due to the reduced bandgap in 6H-polytype, in agreement with theoretical predictions.
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会议论文
New polytypes (4H, 6H) of III-nitrides grown by hetero-step-flow mode on vicinal SiC surfaces
邻位 SiC 表面异质步流模式生长的 III 族氮化物的新多型(4H、6H)
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[Y. Ishiyama, M. Takaki, M. Funato, Y. Kawakami, A. Hashimoto, S. Tanaka]
通讯作者:
S. Tanaka
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