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Metallic glass flux-vapor growth of SiC single crystal films

Metallic glass flux-vapor growth of SiC single crystal films
金属玻璃熔剂-SiC单晶薄膜的气相生长
批准号:
23656028
负责人:
MATSUMOTO Yuji
金额:
$2.41万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012

项目摘要

项目成果

MATSUMOTO Yuji的其他基金

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中文摘要
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英文摘要
In this project, first of all we developed a new laser microscope operated in vacuum, where a laser-heating system was first employed to attain extremely high temperatures up to 1600oC. This new laser microscope, combined with in situ SEM analyses, allowed us to investigate the thermal behavior of metallic glass on a SiC single crystal. Furthermore, in order to verify the potentiality of flux-vapor growth of SiC films, we demonstrated a successful improvement of the film quality in grain size and surface flatness of SiC by using Si-Ni flux. This is a promising result that encourages us to go further in the development of this growth technique for high-quality SiC single crystal films.
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High-throughput Screening of Metal Flux for SiC Solution Growth Using a High-Temperature Laser Microscope Observation and SIMS Depth Profiling
使用高温激光显微镜观察和 SIMS 深度分析对用于 SiC 溶液生长的金属熔剂进行高通量筛选
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [小沼碧海, 丸山伸伍, 松本祐司, Shingo Maruyama]
通讯作者: Shingo Maruyama
PLD法によるSi-Ni系フラックス薄膜を介した SiCホモエピタキシャル成長
使用 PLD 方法通过 Si-Ni 助熔剂薄膜进行 SiC 同质外延生长
DOI: --
发表时间:
期刊:
影响因子: --
作者: [S. Maruyama, Y. Matsumoto, 小沼碧海]
通讯作者: 小沼碧海
高温真空レーザ顕微鏡によるSiC 溶液成長に向けたSi-Cr 系フラックス薄膜の熱挙動観察
使用高温真空激光显微镜观察 SiC 溶液生长的 Si-Cr 熔剂薄膜的热行为
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [小沼碧海, 丸山伸伍, 松本祐司]
通讯作者: 松本祐司
High-throughput Screening of Metal Flux for SiC Solution Growth Using a High-Temperature Laser Microscope Observation and SIMS Depth Profiling
使用高温激光显微镜观察和 SIMS 深度分析对用于 SiC 溶液生长的金属熔剂进行高通量筛选
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [小沼碧海, 丸山伸伍, 松本祐司, Shingo Maruyama, 小沼碧海, 丸山伸伍]
通讯作者: 丸山伸伍
8
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