Development of very thin coaxial cable using fluorine resin covered with high adhesion electroless copper plating
Development of very thin coaxial cable using fluorine resin covered with high adhesion electroless copper plating
批准号:
23656105
负责人:
YAMAMURA Kazuya
金额:
$2.41万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012
中文摘要
近年来,同轴电缆和印刷电路板都需要在GHz频段具有低介电常数和低介电损耗因子的材料。氟碳聚合物具有优异的高频性能。然而,由于其表面能较低,很难在其表面形成高度粘附的金属图案。氟碳聚合物金属化前的表面改性是必不可少的一步。我们提出了一种利用常压等离子体处理和液相自组装相结合的方法来提高化学铜(Cu)膜/氟碳聚合物的附着力的表面改性技术。研究了中压或常压等离子体改性四氟乙烯-全氟烷基乙烯醚共聚物(PFA)表面化学镀铜层的粘附强度。常压等离子体处理的黏附强度是中压等离子体处理的2倍。在90°剥离试验后,通过FTIR分析在化学镀铜膜表面观察到CF2键的强红外峰,认为中压He等离子体辐照在PFA中容易形成损伤层。
英文摘要
Recently, a material with a low dielectric constant and low dielectric loss factor in the GHz band is required for coaxial cable and printed circuit boards. Fluorocarbon polymers have excellent high-frequency properties. However, owing to their low surface energy, it is difficult to form highly adhesive metal patterns on their surface. The surface modification of fluorocarbon polymers before metallization is an essential step. We have proposed a surface modification technique for fluorocarbon polymers that enhances the adhesion of electroless copper (Cu) film/fluorocarbon polymers by a combination of atmospheric-pressure plasma treatment with liquid-phase self-assembly. We investigated the adhesion strength of an electroless Cu-plated layer on a tetrafluoroetylene-perfluoroalkylvinylethercopolymer (PFA) surface modified by medium-pressure or atmospheric-pressure plasma. The atmospheric-pressure He plasma treatment resulted in twice the adhesion strength of that obtained by the medium-pressure He plasma treatment. It is considered that a damaged layer is easily formed in the bulk of PFA by medium-pressure He plasma irradiation because a strong IR peak assigned to the CF2 bond was observed from the surface of the electroless Cu film by FTIR analysis after a 90° peel test.
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Study on Adhesion Strength of Cu Plating Film Formed on PTFE Substrate through Atmospheric Pressure Plasma Liquid Deposition
常压等离子体液体沉积聚四氟乙烯基材上镀铜膜附着力研究
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[Y. Hara, K. Oooka, H. Akiyama, N. Zettsu, K. Yamamura]
通讯作者:
K. Yamamura
DOI:
10.4028/www.scientific.net/kem.523-524.262
发表时间:
2012-11
期刊:
Key Engineering Materials
影响因子:
--
作者:
[Kento Ooka;Y. Yamamoto;Y. Hara;N. Zettsu;K. Yamamura]
通讯作者:
Kento Ooka;Y. Yamamoto;Y. Hara;N. Zettsu;K. Yamamura
Interfacial Analysis of Electroless Copper Thin Film on Fluorocarbon Polymer Fabricated by Plasma Irradiation with Graft Copolymerization
等离子体辐照接枝共聚制备氟碳聚合物化学镀铜薄膜的界面分析
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[K. Ooka, Y. Hara, K. Yamamura]
通讯作者:
K. Yamamura
大気圧プラズマ化学液相堆積法によるフッ素ポリマー表面への高密着性金属配線パターン作製
使用大气压等离子体化学液相沉积在含氟聚合物表面上制造高粘合性金属布线图案
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[大岡健人, 秋山弘貴, 山本悠人, 原 安寛, 山村和也, 是津信行]
通讯作者:
是津信行
プラズマ化学液相堆積法によるフッ素ポリマー表面の銅メタライジングー電解銅めっき膜の密着強度におけるプラズマ発生圧力依存性-
通过等离子体化学液相沉积法在含氟聚合物表面进行铜金属化 - 等离子体产生压力对电解铜镀膜附着强度的依赖性 -
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[大岡健人, 山本悠人, 是津信行, 山村和也]
通讯作者:
山村和也
共 14 条
Development of highly efficient and high precision figuring and finishing technique applying anodic oxidation for mold material made of SiC
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批准号:25630026
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
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财政年份:2013
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负责人:YAMAMURA Kazuya
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依托单位:
Development of high-efficient damage-free figuring process using open-air type atmospheric pressure plasma
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批准号:20360068
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.81万
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财政年份:2008
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负责人:YAMAMURA Kazuya
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依托单位:
海外基金