Creation of super hard coatings with excellent oxidation resistance made from ubiquitous elements

利用普遍存在的元素创建具有优异抗氧化性的超硬涂层

• 批准号: 23656456
• 负责人: NOSE Masateru
• 金额: $ 2.58万
• 依托单位: University of Toyama
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Exploratory Research
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2012
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23656456/
• 关键词: 薄膜プロセス; 硬質保護膜; ナノコンポジット膜; ユビキタス元素; 硬質膜; 差動排気同時成膜法; 反応スパッタ法

We prepared composite films consisting of nitride and oxide in order to obtain new protective coatings having super high hardness and excellent oxidationresistance, which were made from ubiquitous elements. The new nanocomposite coatings consisting of AlN and oxide （SiOx or AlxOy) were deposited with the differential pumping co-sputtering system. The indentation hardness of AlN and the oxide were 24GPa and 11~ 13GPa, respectively. Regardless of the lower hardness of single phase films, the AlN/SiOx or AlN/AxOy nanocomposite coatings showed an increase of ~50% in indentation hardness from that of the AlN film and achieved a maximum hardness of 34 GPa by co-deposition of oxide and nitride. The indentation hardness of some composite coatings barely changed when the coating samples were annealed at 800 ℃×1 hour in air

制备了由氮化物和氧化物组成的复合膜，以获得具有超高硬度和优异抗氧化性能的新型防护涂层。采用差速泵送共溅射系统制备了AlN和氧化物（SiOx或AlxOy）的纳米复合涂层。AlN和氧化物的压痕硬度分别为24GPa和11~ 13GPa。尽管AlN/SiOx或AlN/AxOy纳米复合涂层的硬度较AlN膜低，但其压痕硬度比AlN膜提高了约50%，并通过氧化物和氮化物的共沉积达到了34 GPa的最大硬度。在800℃×1 h空气中退火后，部分复合涂层的压痕硬度变化不大

项目成果

RF反応スパッタ法で作製したSiAlON薄膜の構造と機械的性質

射频反应溅射SiAlON薄膜的结构与力学性能

• 发表时间: 2012
• 作者: K. Yasue;M. Furuhashi;S. Ｋanehira;and K. Kikuta;松本和晃,橋爪 隆,佐伯 淳,野瀬正照
• 通讯作者: 松本和晃,橋爪 隆,佐伯 淳,野瀬正照

Microstructure and properties of AlN/SiOx nanocomposite films preparedby differential pumping co-sputtering system

差动泵浦共溅射系统制备AlN/SiOx纳米复合薄膜的微观结构与性能

• 发表时间: 2012
• 作者: T. Sato;H. Takabatake;T. Kawabata;K.Matsuda;W-A. Chiou;M. Shiojiri;M. Nose
• 通讯作者: M. Nose

差動排気型2元同時成膜装置を用いた窒化物/酸化物ナノコンポジット膜作製

使用差动泵浦双组分同时沉积系统制造氮化物/氧化物纳米复合薄膜

• 发表时间: 2011
• 作者: 佐藤誉将;野瀬正照;松田健二;他4名
• 通讯作者: 他4名

AlN/SiOxナノコンポジット膜の微細構造

AlN/SiOx纳米复合薄膜的微观结构

• 发表时间: 2012
• 作者: 佐藤誉将;高畠浩史,川畑常眞,松田健二,Wen-An Chiou,塩尻 詢,野瀬正照
• 通讯作者: 高畠浩史,川畑常眞,松田健二,Wen-An Chiou,塩尻 詢,野瀬正照

Microstructure and properties of AlN/SiOx nanocomposite films prepared by differential pumping co-sputtering system

差动泵浦共溅射系统制备AlN/SiOx纳米复合薄膜的微观结构与性能

• 发表时间: 2012
• 作者: T. Sato;H. Takabatake;T. Kawabata;K. Matsuda;W-A. Chiou;M. Shiojiri;M. Nose
• 通讯作者: M. Nose