Formation of high flux X-ray nanobeam and its application to scanning X-ray fluorescence microscopy

针对高通量X射线纳米束的形成，研究了制作高退磁X射线聚焦镜的基本技术。开发了一个基于菲涅耳-基尔霍夫积分计算光强分布的模拟器，用于研究可接受的图形误差和对准误差。同时，研制了一套X射线反射镜专用的离子束成象系统。通过对该系统的性能测试，成功地制作出了峰谷误差为2 nm的椭圆镜。

Toward formation of a high flux X-ray nanobeam, the basic techniques to fabricate X-ray focusing mirrors with high demagnification were researched. A simulator that can calculate an intensity profile based on the Fresnel- Kirchhoff integral was developed to investigate acceptable figure errors and alignment errors. Also, an ion beam figuring system specialized for fabricating X-ray mirrors was developed. As a result of a performance test for the system, an elliptical mirror with a 2 nm (peak-to-valley) figure error could be successfully fabricated.