课题基金 / 基金详情

Accurate measurement and statistical analysis of gate leakage current of MOSFETs with atomically flat interface

Accurate measurement and statistical analysis of gate leakage current of MOSFETs with atomically flat interface
原子级平坦界面MOSFET栅极漏电流的精确测量和统计分析
批准号:
24360129
负责人:
SUGAWA Shigetoshi
金额:
$12.15万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012-04-01 至 2015-03-31

项目摘要

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会议论文
DOI: 10.1117/12.2083111
发表时间: 2015-03
期刊:
影响因子: --
作者: [Shunichi Wakashima;Fumiaki Kusuhara;R. Kuroda;S. Sugawa]
通讯作者: Shunichi Wakashima;Fumiaki Kusuhara;R. Kuroda;S. Sugawa
High Selectivity in Dry Etching of Silicon Nitride over Si Using a Novel Hydrofluorocarbon Etch Gas in a Microwave Excited Plasma for FinFET
在微波激发等离子体中使用新型氢氟碳蚀刻气体对 FinFET 进行高选择性干法蚀刻氮化硅
DOI: 10.1149/06103.0029ecst
发表时间: 2014
期刊: ECS Transactions
影响因子: --
作者: [Y. Nakao, T. Matsuo, A. Teramoto, H. Utsumi, K. Hashimoto, R. Kuroda, Y. Shirai, S. Sugawa, and T. Ohmi]
通讯作者: and T. Ohmi
Demonstrating Distribution of SILC Values at Individual Leakage Spots (発表確定)
展示各个泄漏点的 SILC 值分布(公告已确认)
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [M. Tomita, D. Kosemura, K. Usuda, T. Tezuka, and A. Ogura, Akinobu Teramoto]
通讯作者: Akinobu Teramoto
Atomically flattening of Si surface of silicon on insulator and isolation-patterned wafers
绝缘体和隔离图案晶圆上硅表面的原子平坦化
DOI: 10.7567/jjap.54.04da04
发表时间: 2015
期刊: Japanese Journal of Applied Physics
影响因子: 1.5
作者: [Tetsuya Goto, Rihito Kuroda, Naoya Akagawa, Tomoyuki Suwa, Akinobu Teramoto, Xiang Li, Toshiki Obara, Daiki Kimoto, Shigetoshi Sugawa, Tadahiro Ohmi, Yutaka Kamata, Yuki Kumagai, and Katsuhiko Shibusawa]
通讯作者: and Katsuhiko Shibusawa
27
    A high performance CMOS image sensor with high sensitivity and wide dynamic range
    • 批准号:
      19360151
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $12.15万
    • 财政年份:
      2007
    • 负责人:
      SUGAWA Shigetoshi
    • 依托单位:
    An over-100dB wide dynamic range solid-state image sensor with high sensitivity and high S/N ratio.
    • 批准号:
      16360165
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $9.66万
    • 财政年份:
      2004
    • 负责人:
      SUGAWA Shigetoshi
    • 依托单位:
    Photo-resist. Stripping. Technology. by. Gas-liquid. mixture. for. Highly-efficient. Ultra-short-time. Semiconductor. Manufacturing
    • 批准号:
      13555084
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $8.19万
    • 财政年份:
      2001
    • 负责人:
      SUGAWA Shigetoshi
    • 依托单位:
    Highly Sesitive and High-resolution Amplification Solid-State Imagine System with Instant Imaging Parareli Processor
    • 批准号:
      13305024
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $32.7万
    • 财政年份:
      2001
    • 负责人:
      SUGAWA Shigetoshi
    • 依托单位: