High speed graphene based optical modulators and photodetectors on silicon waveguides

我成功地设计了一个硅波导上的超快石墨烯光调制器，并辅以严格的数值模拟和RC电路表征。该设计最终在日本应用物理学会APEX期刊上发表了一篇被接受的论文，影响因子为2.667，并向JSPS致谢。 除此之外，我还利用以前获得的制造技术，在硅波导上制造了一个集成的无源可饱和吸收体与石墨烯。我使用电子束光刻和湿法蚀刻工艺来开发波导。石墨烯在使用PMMA涂层的湿转移处理中转移，并在电子束光刻中图案化。我第一次展示了在Si光子芯片中不同长度的石墨烯中锁模脉冲的不同行为。这是制造所提出/设计的超高速石墨烯调制器的垫脚石，因为我能够成功地制造波导，转移和图案化石墨烯。这项研究发表在日本应用物理学杂志上，并向JSPS致谢。整个调制器的制作工作留待以后的研究，由我的同行们来完成。除了在2个期刊上发表，我的研究还在4个会议上发表，参考了JSPS。

I successfully designed an ultra-fast graphene optical modulator on Si waveguide, supplemented with rigorous numerical simulations and RC circuit characterization. This design culminated in an accepted paper in the APEX journal of the Japanese Society for Applied Physics, Impact Factor, 2.667, with Acknowledgment to JSPS. In addition to this, I utilized the previously obtained fabrication skills to fabricate an integrated passive saturable absorber with graphene on silicon waveguides. I used the e-beam litography and wet etch process to develop waveguides. Graphene was transfered in the wet transfer processed using a PMMA coating, and patterned in e-beam litography. For the first time I showed different behaviour of the mode locked pulse in different lengths of graphene in a Si photonic chip. This was a stepping stone in fabricating the proposed/designed ultra high speed graphene modulator as I was able to succesfully fabricate waveguides, transfer and pattern graphene. This research was published in the Japanese Journal of Applied Physics, with an acknowledgment to JSPS. The fabrication of the full modulator is left for the future research which will be taken over by my peers. In addition to 2 journal publication, my research was presented at 4 conferences, with references to JSPS.