Study on initial growth mechanism of InN under high density radial irradiation for high carrier mobility channel
Study on initial growth mechanism of InN under high density radial irradiation for high carrier mobility channel
批准号:
18H01890
负责人:
KONDO HIROKI
金额:
$11.23万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2018
资助国家:
日本
项目状态:
已结题
起止时间:
2018-04-01 至 2021-03-31
中文摘要
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プラズマ支援原子層プロセスにおける表界面反応層制御・診断
等离子体辅助原子层工艺表面反应层的控制与诊断
DOI:
--
发表时间:
2019
期刊:
影响因子:
--
作者:
[第72回日本酸化ストレス学会学術集会 , 北海道立道民活動センター かでる2・7 , 2019/6/27]
通讯作者:
2019/6/27
Influence of N2/H2 Plasma Irradiation to GaN Substrate for Improving the Interface of the Homoepitaxial GaN Grown by Radical Enhanced MOCVD (REMOCVD)
N2/H2 等离子体辐照对 GaN 衬底对改善自由基增强 MOCVD (REMOCVD) 生长同质外延 GaN 界面的影响
DOI:
--
发表时间:
2018
期刊:
影响因子:
--
作者:
[Amalraj Frank Wilson, Dhasiyan Arun Kumar, Naohiro Shimizu, Osamu Oda, Nobuyuki Ikarashi, Hiroki Kondo, Kenji Ishikawa, and Masaru Hori]
通讯作者:
and Masaru Hori
DOI:
10.1016/j.jcrysgro.2020.125863
发表时间:
2020-11
期刊:
Journal of Crystal Growth
影响因子:
1.8
作者:
[F. Amalraj;Naohiro Shimizu;O. Oda;K. Ishikawa;M. Hori]
通讯作者:
F. Amalraj;Naohiro Shimizu;O. Oda;K. Ishikawa;M. Hori
Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis
通过原位表面分析分析 GaN 深度轮廓的离子能量依赖性
DOI:
--
发表时间:
2020
期刊:
影响因子:
--
作者:
[Masaki Hasagawa, Takayoshi Tsutsumi, Atsushi Tanide, Shohei Nakamura, Hiroki Kondo, Kenji Ishikawa, Masaru Hori]
通讯作者:
Masaru Hori
Effect of N2/H2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD)
N2/H2 等离子体对自由基增强金属有机化学气相沉积 (REMOCVD) 同质外延 GaN 生长的 GaN 衬底清洗的影响
DOI:
10.1063/1.5050819
发表时间:
2018
期刊:
AIP Advances
影响因子:
1.6
作者:
[Amalraj Frank Wilson, Dhasiyan Arun Kumar, Lu Yi, Shimizu Naohiro, Oda Osamu, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Ikarashi Nobuyuki, Hori Masaru]
通讯作者:
Hori Masaru
共 25 条
The impact of family decision making on labor mobility, industrial structural change and interregional specialization pattern
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批准号:17K03711
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.91万
-
财政年份:2017
-
负责人:KONDO HIROKI
-
依托单位:
In-situ observation of bio materials under gas-liquid plasma exposure
-
批准号:25600122
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
-
财政年份:2013
-
负责人:KONDO HIROKI
-
依托单位:
Study on initial growth mechanism of vertically-grown nanographene observed by in-situ TEM
-
批准号:24360015
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$12.15万
-
财政年份:2012
-
负责人:KONDO HIROKI
-
依托单位:
海外基金