Development and Characterization of Ti-Ni-X Ternary Shape Memory Alloy Thin Films
Development and Characterization of Ti-Ni-X Ternary Shape Memory Alloy Thin Films
批准号:
09650714
负责人:
MIYAZAKI Shuichi
金额:
$2.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
Ti-Ni形状记忆合金薄膜具有变形大、恢复力大等优点,可用于制作微驱动器;此外,即使是形状记忆合金的固有缺点,如由于冷却速度的限制,响应速度慢,也可以在薄膜中得到很大的改善。因此,发展钛镍形状记忆合金薄膜已成为迫切需要。本项目成功地在溅射沉积的Ti-Ni-Cu和Ti-Ni-Pd三元形状记忆合金薄膜中实现了理想的形状记忆效应。它们具有较小的温度滞后和较高的相变温度,相变温度和形状记忆特性受热处理工艺和合金成分的影响较大。Ti-Ni-Cu和Ti-Ni-Pd三元形状记忆合金薄膜分别具有较小的温度滞后和较高的相变温度,这些特性有效地实现了高响应的致动器特性。Ti-Ni-Pd薄膜在冷却和加热过程中表现出与Ti-Ni二元合金薄膜相似的单相变。相应地,它们在冷却和加热时都表现出单级变形。Ti-Ni-Cu薄膜表现出两阶段相变,即两阶段变形,第一阶段对应于B2与O(正交)相之间的转变,第二阶段对应于0相与M相之间的转变。第一阶段相变伴随着一个小的温度滞后。所有这些薄膜都表现出了完美的形状记忆效应。
英文摘要
Ti-Ni shape memory alloy thin films have great advantages such as large deformation and recovery force for fabricating microactuators ; besides, even an intrinsic disadvantage of the shape memory alloy such as a slow response due to the limitation of cooling rate can be greatly improved in thin films. Therefore, the development of Ti-Ni shape memory alloy thin films has been keenly demanded. The present project has been successful in developing a perfect shape memory effect in sputter-deposited Ti-Ni-Cu and Ti-Ni-Pd ternary shape memory alloy thin films were also made by sputtering. They showed a small temperature hysteresis and high transfo, The transformation temperatures and shape memory characteristics were found to be strongly affected by heat-treatment and alloy composition. Ti-Ni-Cu and Ti-Ni-Pd ternaryshape memory alloy thin films showed a small temperature hysteresis and high transformation temperatures, respectively ; these characteristics are effective to achieve a high response actuator characteristic. The Ti-Ni-Pd thin film showed a single stage transformation upon cooling and heating similarly to a Ti-Ni binary alloy thin films. Corre- sponding, they showed a single stage deformation both upon cooling and heating. The Ti-Ni-Cu thin film showed a two-stage transformation and hence a two-stage deformation ; the first stage corresponds to the transformation between B2 and O(Orthorhombic)-phase and the second stage between the 0- and M-phases. The first stage transformation was accompanied by a small temperature hysteresis. All these thin films showed perfect shape memory effect.
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C.Lexcellent,S.Moine,A.Ishida and S.Miyazaki: "Deformation Behavior Associated with the Ti-Ni Thin Films and Their Thermodyamical Modelling" Thin Solid Films. 324. 184-189 (1998)
C.Lexcellent、S.Moine、A.Ishida 和 S.Miyazaki:“与 Ti-Ni 薄膜及其热力学建模相关的变形行为”固体薄膜。
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通讯作者:
Z.G.Wei,R.Sandstrom and S.Miyazaki: "Shape Memory Materials and Their Hybrid Composites for Smart Systems,Part I : Shape Memory Materials" Journal of Materials Science. 33. 3743-3762 (1998)
Z.G.Wei、R.Sandstrom 和 S.Miyazaki:“用于智能系统的形状记忆材料及其混合复合材料,第一部分:形状记忆材料”材料科学杂志。
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通讯作者:
B.Raniecki,S.Miyazaki,C.Lexcellent,K.Tanaka and L.Dietrich: "Deforamtion Behaviour of TiNi SMA Undergoing R-phase Transformation in Tortion-Tention (Compression) Tests" Proc.of 32nd Solid Mechanics Conference,Zakopane,Poland. 415-416 (1998)
B.Raniecki、S.Miyazaki、C.Lexcellent、K.Tanaka 和 L.Dietrich:“TiNi SMA 在扭转张力(压缩)测试中经历 R 相转变的变形行为”第 32 届固体力学会议论文集,扎科帕内,
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通讯作者:
A.Ishida,M.Sato and S.Miyazaki: "Mechanical Properties of Ti-Ni Shape Memory Thin Films Formed by Sputtering" Materials Science and Engineering. A (in press). (1999)
A.Ishida、M.Sato 和 S.Miyazaki:“溅射形成的 Ti-Ni 形状记忆薄膜的机械性能”材料科学与工程。
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通讯作者:
S.Miyazaki: "Ti-Ni Thin Films" Proc.Inter.Symp.and Exhibition on Shape Memory Materials,SMM-99,Kanazawa,Japan. (in press). (1999)
S.Miyazaki:“Ti-Ni Thin Films”Proc.Inter.Symp.and Exhibition on Shape Memory Materials,SMM-99,金泽,日本。
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共 63 条
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Development of Microactuators Possessing High Power and Large Actuation Utilizing Ti-Ni Sputter-deposited Shape Memory Alloy Films
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