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Basic research on the shape memory alloy thin films

Basic research on the shape memory alloy thin films
形状记忆合金薄膜的基础研究
批准号:
05452272
负责人:
MIYAZAKI Shuichi
金额:
$3.65万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1994

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中文摘要
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英文摘要
Among several types of performance materials proposed for fabricating microactuators to power micromachines, Ti-Ni shape memory alloy thin films have great advantages such as large deformation and recovery force ; besides, even an intrinsic disadvantage of the shape memory alloy such as a slow response due to the limitation of cooling rate can be greatly improved in thin films. Therefore, the development of Ti-Ni shape memory alloy thin films has been keenly demanded. The present project has been successful in developing a perfect shape memory effect in sputter-deposited Ti-Ni thin films. The transformation temperatures and shape memory characteristics were found to be strongly affected by heat-treatment, alloy composition and sputtering condition. The shape change and recovery force associated with the martensitic transformation in Ti-Ni thin films reached up to 6% and 500Mpa, respectively, which were equivalent to those of bulk specimens.Ti-Ni-Cu and Ti-Ni-Pd ternary shape memory alloy thin films were also made by sputtering. They showed a small temperature hysteresis and high transformation temperatures, respectively ; these characteristics are effective to achieve a high response actuator characteristic. The Ti-Ni-Pd thin film showed a single stage transformation upon cooling and heating similarly to a Ti-Ni binary alloy thin films. Corresponding, they showed a single stage deformation both upon cooling and heating. The Ti-Ni-Cu thin film showed a two-stage transformation and hence a two-stage deformation ; the first stage corresponds to the transformation between B2 and O(Orthorhombic)-phase and the second stage between the O- and M-phases. The first stage transformation was accompanied by a small temperature hysteresis. All these thin films showed perfect shape memory effect.
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会议论文
S.Miyazaki他: "Shape Memory Characteristics of Sputter-deposited Ti-Ni Thin Films" Materials Transaction JIM. 34. 14-19 (1994)
S. Miyazaki 等人:“溅射沉积 Ti-Ni 薄膜的形状记忆特性”Materials Transaction JIM。34. 14-19 (1994)
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通讯作者:
K.Nomura他: "Transformation and Deformation Behavior of Sputter-deposited Ti-Ni Thin Films" Trans.Mater.Res.Soc.Jpn.18B. 1049-1052 (1994)
K. Nomura 等人:“溅射沉积 Ti-Ni 薄膜的转变和变形行为”Trans.Mater.Res.Soc.Jpn.18B (1994)。
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S.Miyazaki他: "Effect of Heat Treatment on Deformation Behavior Associated with R-phase and Martensitic Transformations in Ti-Ni Thin Films" Trans.Mater.Res.Sco.Jpn.18B. 1041-1044 (1994)
S. Miyazaki 等人:“热处理对 Ti-Ni 薄膜中与 R 相和马氏体转变相关的变形行为的影响”Trans.Mater.Res.Sco.Jpn.18B (1994)。
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通讯作者:
M.Satoh, A.Ishida, A.Takei and S.Miyazaki: "Effect of Thermal Cycling on the Transformation Temperatures of Ti-Ni Shape Memory Alloy Thin Films" Surface Technology. 45. 1308-1309 (1994)
M.Satoh、A.Ishida、A.Takei 和 S.Miyazaki:“热循环对钛镍形状记忆合金薄膜转变温度的影响”表面技术。
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