Particle Changing using UV/Photoelectron Method at Low Pressures

在低压下使用紫外/光电子方法改变颗粒

• 批准号: 09650849
• 负责人: ADACHI Motoaki
• 金额: $ 2.11万
• 依托单位: Osaka Prefecture University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09650849/
• 关键词: Semiconductor; Nanometer-sized particle; Vacuum process; UV excitation; Photoelectron emission; Charging; Particle collection

Two devices using UV/photoelectron method were developed. In one device, photoelectrons are released from the photoelectron emitter by UV irradiation (Photoelectron emission-diffusion charging device, PE-CD) and, in other, they are done directly from particles (Direct photoelectron charging device, DPC). Two devices were estimated theoretically and experimentally. In the experiments, SiOィイD22ィエD2 particles prepared by CVD method were used. For PE-DC device, the reduce of pressure decreased strongly the particle charge, but the UV intensity and particle size gave small effects on the charge. The experimental results agreed well with numerical simulation. For DPC device, particle charge increased with the increase of UV Intensity and particle size and the decrease of the pressure. The numerical results explained the tendency of charging but did not quantitatively.

研制了两种紫外/光电子法器件。在一种装置中，光电子通过紫外线照射从光电子发射器释放出来（光电子发射扩散充电装置，PE-CD），而在另一种装置中，光电子直接从粒子中释放出来（直接光电子充电装置，DPC）。对两种器件进行了理论和实验估计。实验采用CVD法制备的二氧化硅（SiO）颗粒。对于PE-DC器件，压力的降低对粒子电荷的影响较大，而紫外线强度和粒子尺寸对电荷的影响较小。实验结果与数值模拟结果吻合较好。对于DPC器件，粒子电荷随紫外强度、粒径的增大和压力的减小而增大。数值结果解释了电荷的趋势，但没有定量解释。

项目成果

M. Shimada, S. J. Cho, K. Okuyama, T. Tamura, M. Adachi and T. Fujii: "Removal of Airborn Particles by a Tublar Particle-Removal Device Using UV/Photoelectron Method"J. of Aerosol Sci.. 28. 649-661 (1997)

M. Shimada、S. J. Cho、K. Okuyama、T. Tamura、M. Adachi 和 T. Fujii：“使用 UV/光电子方法通过管状颗粒去除装置去除空气中的颗粒”J。

M.Adachi, T.Fujimoto, K.Okuyama: "Motion Control of Ionized Intermediates in TEOS/OィイD23-ィエD2 APCVD Reactor"Proc.1st Asia Aerosol Conf.. 219-220 (1999)

M.Adachi、T.Fujimoto、K.Okuyama：“TEOS/OiD23-IeD2 APCVD 反应器中离子中间体的运动控制”Proc.1st Asia Aerosol Conf.. 219-220 (1999)

M.Adachi, O.Sudo, T.Takahashi: "Charge Measurement of Nanometer-Sized Particles at Low Pressure."J of Aerosol Research, Jpn.. 13-2(in Japanese). 94-102 (1998)

M.Adachi、O.Sudo、T.Takahashi：“低压下纳米尺寸颗粒的电荷测量”。气溶胶研究杂志，Jpn.. 13-2（日语）。

M. Adachi, T. Fujimoto, K. Okuyama: "Motion Control of lonized Intermediates in TEOS/O_3-APCVD Reactor"Proc. 1st Asia Aerosol Conf.. 219-220 (1999)

M. Adachi、T. Fujimoto、K. Okuyama：“TEOS/O_3-APCVD 反应器中离子化中间体的运动控制”Proc。