Particle Changing using UV/Photoelectron Method at Low Pressures
Particle Changing using UV/Photoelectron Method at Low Pressures
批准号:
09650849
负责人:
ADACHI Motoaki
金额:
$2.11万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999
中文摘要
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英文摘要
Two devices using UV/photoelectron method were developed. In one device, photoelectrons are released from the photoelectron emitter by UV irradiation (Photoelectron emission-diffusion charging device, PE-CD) and, in other, they are done directly from particles (Direct photoelectron charging device, DPC). Two devices were estimated theoretically and experimentally. In the experiments, SiOィイD22ィエD2 particles prepared by CVD method were used. For PE-DC device, the reduce of pressure decreased strongly the particle charge, but the UV intensity and particle size gave small effects on the charge. The experimental results agreed well with numerical simulation. For DPC device, particle charge increased with the increase of UV Intensity and particle size and the decrease of the pressure. The numerical results explained the tendency of charging but did not quantitatively.
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M. Shimada, S. J. Cho, K. Okuyama, T. Tamura, M. Adachi and T. Fujii: "Removal of Airborn Particles by a Tublar Particle-Removal Device Using UV/Photoelectron Method"J. of Aerosol Sci.. 28. 649-661 (1997)
M. Shimada、S. J. Cho、K. Okuyama、T. Tamura、M. Adachi 和 T. Fujii:“使用 UV/光电子方法通过管状颗粒去除装置去除空气中的颗粒”J。
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M.Adachi, T.Fujimoto, K.Okuyama: "Motion Control of Ionized Intermediates in TEOS/OィイD23-ィエD2 APCVD Reactor"Proc.1st Asia Aerosol Conf.. 219-220 (1999)
M.Adachi、T.Fujimoto、K.Okuyama:“TEOS/OiD23-IeD2 APCVD 反应器中离子中间体的运动控制”Proc.1st Asia Aerosol Conf.. 219-220 (1999)
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M.Adachi, O.Sudo, T.Takahashi: "Charge Measurement of Nanometer-Sized Particles at Low Pressure."J of Aerosol Research, Jpn.. 13-2(in Japanese). 94-102 (1998)
M.Adachi、O.Sudo、T.Takahashi:“低压下纳米尺寸颗粒的电荷测量”。气溶胶研究杂志,Jpn.. 13-2(日语)。
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M. Adachi, T. Fujimoto, K. Okuyama: "Motion Control of lonized Intermediates in TEOS/O_3-APCVD Reactor"Proc. 1st Asia Aerosol Conf.. 219-220 (1999)
M. Adachi、T. Fujimoto、K. Okuyama:“TEOS/O_3-APCVD 反应器中离子化中间体的运动控制”Proc。
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Synthesis of GdCeO nanoparticles and formation of electrite film from synthesized particles by spin corting method
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批准号:22360331
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.15万
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财政年份:2010
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负责人:ADACHI Motoaki
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依托单位:
Gas Phase Synthesis of Non-Agglomerated Nanoparticles Using Coulombic Repulsive Force
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资助金额:$2.33万
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财政年份:2005
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负责人:ADACHI Motoaki
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依托单位:
Control of gas phase reactions in low pressure chemical vapor deposition film formation process
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批准号:13450329
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.02万
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财政年份:2001
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负责人:ADACHI Motoaki
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依托单位:
Development of Particle-free CVD Reactor Using Ionization of source Gas
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批准号:09555240
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$5.5万
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财政年份:1997
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负责人:ADACHI Motoaki
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依托单位:
Establishment of Film-Formation Method by lonization in TEOS-CVD Process
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批准号:05650769
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.47万
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财政年份:1993
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负责人:ADACHI Motoaki
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依托单位: