Precise determination of surface process using a new real time surface imaging system

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To invent next generation semiconductor devices and perfect catalysts with 100% selectivity and 100% conversion, it is indispensable to establish a technique to fabricate surfaces precisely controlled on an atomic/molecular level. To attain this goal, it is necessary not only to follow surface chemical phenomena on an atomic/molecular level but to reveal the behavior of ensembles and whole processes of chemical reaction on the surface. In particular, one can understand overall surface reaction processes by investigation of desorbed reaction products and their angle distribution. On this standpoint of view we developed an in-situ real time emission electron imaging system with multiple excitation sources and observed surface phenomena on an atomic scale during the surface reaction using the in-situ real time imaging system together with STM (Scanning tunneling microscopy) and ESDIAD (electron stimulated desorption ion angle distribution). As a result, we have succeeded in visualizing real-time surface phenomena during the reaction processes on the surface of semiconductors and metals by means of PEEM (photo emission electron microscopy) and MEM (mirror electron microscopy) and also observing the behavior of the adsorbates on an atomic scale. We revealed the its interaction of the surface and the decomposition process of methanol.