Mechanisms and Control of Resistive Switching in Dielectrics
Mechanisms and Control of Resistive Switching in Dielectrics
批准号:
EP/M00662X/1
负责人:
Paul Chalker
金额:
$63.73万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2015
资助国家:
英国
项目状态:
已结题
起止时间:
2015 至 --
中文摘要
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英文摘要
So-called "resistive-switching" devices are based on nanostructured dielectric materials, in which the resistance can be varied and memorised. Arguably these devices will lead to a range of disruptive technologies in the field of infromation storage over the next 20 years. Potentially these non-volatile resistive-switching devices can have potentially high speeds, high densities, long retention times and high endurance which will drastically enhance the performance of non-volatile memories and also revolutionise the computer architectures. This research sets out to understand the property - process - structure relationships of oxide dielectrics with programmable resistance. A combination of modelling, synthesis and characterisation will be used to advance the understanding of defects in oxide materials and their control. The aims of the proposed research are to elucidate the nature and mechanisms of the formation and migration of the defects and to explore ways to control and enhance their electrical properties for resistive-switching applications. The global market for memory devices amounts to more than $57 billion and has been projected to grow to $99 billion by 2015. Within this market, a number of existing memory technologies, (DRAM, SRAM, and NAND Flash) have inherent scaling issues to overcome beyond the next generation. The search for alternative solutions is gaining momentum and an alternative candidate is Resistive RAM which exploits the resistive-switching mechanism. The UK Electronic Systems Community employs more than 850,000 people, which constitutes approximately 3% of the UK workforce. Approximately half of this employment is found in the 30,000 enterprises whose business is overtly the provision of Electronic Systems and the technologies and capabilities they need. The rest are within businesses that occupy market sectors spanning aerospace, defence, healthcare, retail, media and education. The potential impact of this project will be the development of a new manufacturing process technology, which will have applications across these sectors in the UK. The impact in terms of new materials, chemistry, products and processes will be significant if the projeproposed objectives are realised.
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DOI:
10.1016/j.sse.2019.107735
发表时间:
2020-06-01
期刊:
SOLID-STATE ELECTRONICS
影响因子:
1.7
作者:
[Qi, Y. F., Shen, Z. J., Zhao, Ce Zhou]
通讯作者:
Zhao, Ce Zhou
(Invited) Vacuum Ultraviolet Photochemical Atomic Layer Deposition of Alumina and Titania Films
(特邀)真空紫外光化学原子层沉积氧化铝和二氧化钛薄膜
DOI:
10.1149/06907.0139ecst
发表时间:
2015
期刊:
ECS Transactions
影响因子:
--
作者:
[Chalker P]
通讯作者:
Chalker P
DOI:
10.1063/1.4991879
发表时间:
2017-08-28
期刊:
APPLIED PHYSICS LETTERS
影响因子:
4
作者:
[Sedghi, N., Li, H., Chalker, P. R.]
通讯作者:
Chalker, P. R.
DOI:
10.1116/1.5079574
发表时间:
2019-03-01
期刊:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
影响因子:
1.4
作者:
[Maji, S., Samanta, S., Mahapatra, R.]
通讯作者:
Mahapatra, R.
The Over-Reset Phenomenon in Ta2O5 RRAM Device Investigated by the RTN-Based Defect Probing Technique
基于RTN的缺陷探测技术研究Ta2O5 RRAM器件中的过复位现象
DOI:
10.17863/cam.34421
发表时间:
2018
期刊:
影响因子:
--
作者:
[Chai Z]
通讯作者:
Chai Z
共 6 条
HiPIMS-CVD Hybrid Process for Advanced Functional Coatings: Proof of concept
-
批准号:EP/N031687/1
-
项目类别:Research Grant
-
资助金额:$24.46万
-
财政年份:2016
-
负责人:Paul Chalker
-
依托单位:
An in-situ LEIS facility for atomic-scale assembly manufacturing research
-
批准号:EP/P001297/1
-
项目类别:Research Grant
-
资助金额:$53.11万
-
财政年份:2016
-
负责人:Paul Chalker
-
依托单位:
Manufacturing with Light 2: photochemical ALD to manufacture functional thin films
-
批准号:EP/N017773/1
-
项目类别:Research Grant
-
资助金额:$78.02万
-
财政年份:2015
-
负责人:Paul Chalker
-
依托单位:
Manufacturing with Light - photochemical ALD to manufacture functional thin films
-
批准号:EP/L02201X/1
-
项目类别:Research Grant
-
资助金额:$25.54万
-
财政年份:2014
-
负责人:Paul Chalker
-
依托单位:
A Novel Active Anode for Improved Photomultiplier Dynamic Range and Lifetime
-
批准号:ST/L000164/1
-
项目类别:Research Grant
-
资助金额:$7.52万
-
财政年份:2013
-
负责人:Paul Chalker
-
依托单位:
Liquid injection ALD of Cp- based precursors for deposition of dielectric materials
-
批准号:EP/D068606/1
-
项目类别:Research Grant
-
资助金额:$66.72万
-
财政年份:2006
-
负责人:Paul Chalker
-
依托单位:
国内基金
海外基金
Cortical control of internal state in the insular cortex-claustrum region
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批准号:--
-
项目类别:--
-
资助金额:25万元
-
批准年份:2020
-
负责人:Robert Konrad Naumann
-
依托单位: