Manufacturing with Light 2: photochemical ALD to manufacture functional thin films
Manufacturing with Light 2: photochemical ALD to manufacture functional thin films
批准号:
EP/N017773/1
负责人:
Paul Chalker
金额:
$78.02万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2015
资助国家:
英国
项目状态:
已结题
起止时间:
2015 至 --
中文摘要
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英文摘要
The purpose of this project is to develop a novel photochemical atomic layer deposition (ALD) manufacturing technology to coat three - dimensional components and feedstock powders with ultrathin functional coatings. Conventional atomic layer deposition is already widely used in the displays and microelectronics industries. It is a thermo-chemical process where two precursor reagents are pulsed in cycles onto a heated work piece. The combination of the substrate temperature and the chemical reaction energy drive the process forward to deposit the thin film layer by layer. Because the process occurs on the surface, highly uniform and conformal layers can be deposited onto high-aspect ratio or porous materials with ultraprecise thickness control. The hypothesis for the proposed research is to use a photo-excitation process to activate one or both of the ALD chemical reagents so that they can react to deposit the thin film with a lower thermal input from a substrate heater. We will adapt the existing Round 1 ALD reactor at Liverpool to incorporate a larger scale chamber capable of containing: (1) an array of 3D components; and (2) reactor furniture for a fluidised bed powder treatment system. The modified system will be built to accommodate ultraviolet sources for the processing of 3D components or the treatment of powder beds. We also propose to use new UV source lamps to target the wavelength of the output from a range of commercially available UV lamp modules to photo-chemically decompose the precursors to form the film. The replacement chamber will also be manufactured to enable access for in-situ monitoring of the deposition process using an existing fibre-optic cable based Raman probe and a quartz crystal microbalance. These will provide feedback on the start of deposition as a function of illumination, substrate temperature, flow rates etc. If achieved, these objectives represent a significant advancement of existing ALD technology and would open up new applications where ultrathin functional materials can be exploited, such as display electronics, biomedical devices and photovoltaics amongst others.
期刊论文(7)
专著(0)
科研奖励(0)
会议论文
(Invited) Vacuum Ultraviolet Photochemical Atomic Layer Deposition of Alumina and Titania Films
(特邀)真空紫外光化学原子层沉积氧化铝和二氧化钛薄膜
DOI:
10.1149/06907.0139ecst
发表时间:
2015
期刊:
ECS Transactions
影响因子:
--
作者:
[Chalker P]
通讯作者:
Chalker P
Vacuum ultraviolet photochemical selective area atomic layer deposition of Al2O3 dielectrics
Al2O3 电介质的真空紫外光化学选区原子层沉积
DOI:
10.1063/1.4905887
发表时间:
2015
期刊:
AIP Advances
影响因子:
1.6
作者:
[Chalker P]
通讯作者:
Chalker P
DOI:
10.1016/j.mtla.2020.100590
发表时间:
2020-01
期刊:
Materialia
影响因子:
3.4
作者:
[X. Garmendia;S. Chalker;Matthew Bilton;C. Sutcliffe;P. Chalker]
通讯作者:
X. Garmendia;S. Chalker;Matthew Bilton;C. Sutcliffe;P. Chalker
HiPIMS-CVD Hybrid Process for Advanced Functional Coatings: Proof of concept
-
批准号:EP/N031687/1
-
项目类别:Research Grant
-
资助金额:$24.46万
-
财政年份:2016
-
负责人:Paul Chalker
-
依托单位:
An in-situ LEIS facility for atomic-scale assembly manufacturing research
-
批准号:EP/P001297/1
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项目类别:Research Grant
-
资助金额:$53.11万
-
财政年份:2016
-
负责人:Paul Chalker
-
依托单位:
Mechanisms and Control of Resistive Switching in Dielectrics
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批准号:EP/M00662X/1
-
项目类别:Research Grant
-
资助金额:$63.73万
-
财政年份:2015
-
负责人:Paul Chalker
-
依托单位:
Manufacturing with Light - photochemical ALD to manufacture functional thin films
-
批准号:EP/L02201X/1
-
项目类别:Research Grant
-
资助金额:$25.54万
-
财政年份:2014
-
负责人:Paul Chalker
-
依托单位:
A Novel Active Anode for Improved Photomultiplier Dynamic Range and Lifetime
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批准号:ST/L000164/1
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项目类别:Research Grant
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资助金额:$7.52万
-
财政年份:2013
-
负责人:Paul Chalker
-
依托单位:
Liquid injection ALD of Cp- based precursors for deposition of dielectric materials
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批准号:EP/D068606/1
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项目类别:Research Grant
-
资助金额:$66.72万
-
财政年份:2006
-
负责人:Paul Chalker
-
依托单位:
国内基金
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