Electrodeposited 2D Transition Metal Dichalcogenides on graphene: a novel route towards scalable flexible electronics
Electrodeposited 2D Transition Metal Dichalcogenides on graphene: a novel route towards scalable flexible electronics
批准号:
EP/V062689/1
负责人:
Cornelis Hendrik De Groot
金额:
$130.47万
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2022
资助国家:
英国
项目状态:
未结题
起止时间:
2022 至 --
中文摘要
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英文摘要
Like graphene, a layer of a transition metal dichalcogenide (TMDC), ME2 (where M = transition metal and E = sulfur, selenium or tellurium), consists of a single- or few-atom-thick, covalently bonded lattice. These atomic sheets exhibit extraordinary electronic and optical properties, as they do not suffer from dangling bonds and trap states at the surface. The van der Waals interactions between the layers allows the integration of very different materials without the constraints of crystal lattice matching. Moreover, those few layers can withstand mechanical strains of 10%, which makes these materials particularly suitable for flexible electronic devices, a market expected to be worth more than £10B in the next five years. Heterostructures of 2D materials and graphene have great potential for various electronic, opto-electronic, energy, and sensor applications but are held back by technological limitations. It is the intention of this proposal to take advantage of our recent breakthroughs in electrodeposition of few layer 2D chalcogenides, such as MoS2 and WS2, on metal as well graphene electrodes. We will demonstrate these advantages through a variety of devices which combine state-of-the-art performance together with scalable, industrially acceptable processing on flexible substrates. Working with our project partners we will aim to maximise the potential societal and economic impacts that emerge from this work.
期刊论文(2)
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会议论文
Tungsten dichalcogenide WS 2 x Se 2-2 x films via single source precursor low-pressure CVD and their (thermo-)electric properties
通过单源前驱体低压 CVD 制备的二硫钨 WS 2 x Se 2-2 x 薄膜及其(热)电性能
DOI:
10.1039/d3ta00466j
发表时间:
2023
期刊:
Journal of Materials Chemistry A
影响因子:
11.9
作者:
[Sethi V]
通讯作者:
Sethi V
Spintronic device physics in Si/Ge Heterostructures
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批准号:EP/J002968/1
-
项目类别:Research Grant
-
资助金额:$54.09万
-
财政年份:2012
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负责人:Cornelis Hendrik De Groot
-
依托单位:
Semi-insulating Silicon substrates for high frequency integrated circuits
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批准号:EP/F033311/1
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项目类别:Research Grant
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资助金额:$39.33万
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财政年份:2008
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负责人:Cornelis Hendrik De Groot
-
依托单位:
国内基金
海外基金
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