Photonic integration using Laser interference structured substrates
Photonic integration using Laser interference structured substrates
批准号:
EP/X016838/1
负责人:
Mark Hopkinson
金额:
$25.77万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2022
资助国家:
英国
项目状态:
未结题
起止时间:
2022 至 --
中文摘要
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英文摘要
The integration of diverse semiconductor materials on a single substrate is highly desirable for future electronic and photonic devices. In particular, the integration of III-V semiconductors on silicon, the industry substrate of choice, would leverage the benefits of existing electronic device concepts based on the low-cost, large wafer size and the excellent manufacturability of silicon with III-V materials offering superior electronic and photonic performance However materials integration has remained a challenge over many years due to dissimilarities in the crystal size and other properties which need to be accommodated at the interface of these materials without propagating into the III-V layer.To address this issue, we propose a radical method to monolithically integrate III-V materials onto silicon substrates using an innovative silicon substrate nanostructuring process based on direct laser interference. The approach transforms the planar silicon surface into a highly structured array which can accommodate the differences between crystal size and type. This novel approach has potential to leverage the benefits of the monolithic integration of III-V devices on a Si-based platform, which is an essential requirement for next-generation photonic integrated circuits, III-V CMOS, and quantum devices. The project is high risk-high reward, based on incidental observations from a previous project. Some proof of principle exists, but the overall approach is yet to be fully explored. If successful, this could finally solve the problem of highly mismatched epitaxy and have transformational impact on industry, opening the prospect of integration of a wide range of alternative materials on the substrate of industry choice. The proposal seeks to develop this approach to produce high quality III-V buffer layers onto silicon. On to these III-V layers we will grow, fabricate, and test photonic devices such as laser and solar cells. The demonstration of laser operation is a critical device demonstration for off-chip optical interconnects to CMOS enabling faster connection between individual processors and overcoming a major bottleneck which will limit next-generation computing performance. The multijunction solar cell combines absorbing junctions of silicon and at least two III-V junctions. Semiconductor multijunction cells offer the highest quantum efficiency of all photovoltaics, with potential to go further and exceed 50%. However, the current technology approach means that these cells are far too expensive for consumer use. We believe we have the potential to provide a lower cost approach through our in-situ produced structured substrates, which if successful could revolutionise solar energy generation.
期刊论文(2)
专著(0)
科研奖励(0)
会议论文
DOI:
10.1109/3m-nano58613.2023.10305322
发表时间:
2023-07
期刊:
2023 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
影响因子:
--
作者:
[Yun-Ran Wang;I. S. Han;M. Hopkinson]
通讯作者:
Yun-Ran Wang;I. S. Han;M. Hopkinson
Fabrication of quantum dot and ring arrays by direct laser interference patterning for nanophotonics
DOI:
10.1515/nanoph-2022-0584
发表时间:
2023-01
期刊:
Nanophotonics
影响因子:
7.5
作者:
[Yun-Ran Wang;I. S. Han;M. Hopkinson]
通讯作者:
Yun-Ran Wang;I. S. Han;M. Hopkinson
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
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批准号:EP/P027822/1
-
项目类别:Research Grant
-
资助金额:$99.89万
-
财政年份:2017
-
负责人:Mark Hopkinson
-
依托单位:
SBIR Phase I: An Innovative Treatment Process for Nitrate Removal from Water
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批准号:1621986
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项目类别:Standard Grant
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资助金额:$22.45万
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财政年份:2016
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负责人:Mark Hopkinson
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依托单位:
海外基金