Capability for wafer-level sub-nanometre scale imaging

晶圆级亚纳米级成像能力

• 批准号: EP/X041166/1
• 负责人: Goran Mashanovich
• 金额: $ 208.15万
• 依托单位: University of Southampton
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2023
• 资助国家: 英国
• 起止时间: 2023 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FX041166%2F1
• 关键词: Capability; wafer; level; sub; nanometre

The critical importance of capabilities for semiconductor research in the UK is recognised as part of a national strategy, as stressed in the recent BEIS Report 'The semiconductor industry in the UK'. Particular strength in research is centred around a number of cleanroom facilities located at academic institutuions. The University of Southampton hosts a range of cutting-edge nanofabrication tools which enable a range of research activities in electronic and photonic devices. Fabrication of semiconductor devices and circuits becomes cost effective when processed on a large wafer. However, process efficiency can only be achieved if an ultra-high-resolution scanning electron microscope (SEM) with material characterisation system is available to provide high throughput feedback results to improve fabrication and facilitate novel process development. Manually operated SEMs are a common imaging tool for characterisation used in academic research but automated in-line imaging of wafers throughout a process flow is required to achieve fast imaging and shorten inspection time from fabrication processes.The aim of the proposal is to acquire an ultra-high-resolution SEM (UHR-SEM) capable of material characterisation for wafers up to 200 mm in diameter at the University of Southampton. As device feature sizes are reduced, dimension and performance variations across the wafer become an issue which must be mitigated at the early stage of the fabrication. Therefore, the proposed UHR-SEM will be unique within the UK academic landscape since it will perform automated in-line imaging and analysis of entire wafers up to 200 mm in diameter at sub-nm resolution. The system will also have a low landing voltage on samples to reduce surface damage during imaging of delicate devices and patterned resists, as well as a good depth of focus for the inspection of thick multi-stack materials. The UHR-SEM will address the main challenges in large wafer imaging such as generating relevant surface metrology information at nanoscale dimensions and creating a detailed map showing various material parameters such as chemical composition and defect distribution.

英国半导体研究能力的至关重要性被认为是国家战略的一部分，正如最近的BEIS报告“英国半导体行业”所强调的那样。研究的特别优势集中在位于学术机构的一些洁净室设施上。南安普顿大学拥有一系列尖端的纳米纤维工具，可以在电子和光子器件方面进行一系列研究活动。当在大晶片上处理时，半导体器件和电路的制造变得成本有效。然而，只有当具有材料表征系统的超高分辨率扫描电子显微镜（SEM）可用于提供高通量反馈结果以改进制造并促进新工艺开发时，才能实现工艺效率。手动操作的扫描电镜是一种常见的成像工具，用于表征在学术研究中使用，但需要在整个工艺流程中的晶片自动在线成像，以实现快速成像和缩短检查时间从制造processs.The建议的目的是获得超高分辨率扫描电镜（UHR-SEM）的材料表征的晶圆直径可达200毫米在南安普顿大学。随着器件特征尺寸的减小，晶片上的尺寸和性能变化成为必须在制造的早期阶段减轻的问题。因此，拟议中的UHR-SEM将在英国学术界独树一帜，因为它将以亚纳米分辨率对直径达200 mm的整个晶圆进行自动在线成像和分析。该系统还将在样品上具有低着陆电压，以减少在精密器件和图案化抗蚀剂成像期间的表面损伤，以及用于厚多叠层材料检查的良好焦深。UHR-SEM将解决大型晶圆成像的主要挑战，例如在纳米尺度上生成相关的表面计量信息，并创建显示各种材料参数（如化学成分和缺陷分布）的详细地图。