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Thin films for silicon-based tandem photovoltaics 1=Energy 2=Solar Technology

Thin films for silicon-based tandem photovoltaics 1=Energy 2=Solar Technology
用于硅基串联光伏发电的薄膜 1=能源 2=太阳能技术
批准号:
2166291
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2019
资助国家:
英国
项目状态:
已结题
起止时间:
2019 至 --

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中文摘要
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英文摘要
More than 90% of photovoltaic solar cells are made from crystalline silicon, and this market share is increasing as worldwide installations approach the terawatt level. The best single-junction silicon cells have efficiencies of up to 26.7%, and record cells are closing in on silicon's maximum efficiency of 29.4%. This limit can be exceeded by depositing or mounting a wider bandgap semiconductor on top of the silicon-based solar cell to form a tandem configuration, which are capable of exceeding efficiencies of 35%. Such device architectures are very timely, and if successful will have a significant impact on global energy production through renewable sources.Much attention has focused on placing a variety of thin film semiconductors onto silicon (e.g. perovskites, CdTe, CIGS), but less attention has been paid on the interface with the silicon. This PhD project will address the fundamental science underpinning the interface between the silicon and the thin film semiconductor to accelerate the development of tandem cells. The aim is to develop ultra-thin passivation films (< 1 nm) using atomic layer deposition (ALD), which exhibit excellent thermal and electrical stability when applied to semiconductor surfaces. The objective will be to develop a fundamental understanding of the passivation mechanism at the atomic scale and how processes can be manipulated in order to achieve optimal long-term thermal and electrical properties. The films developed will then be applied in a range of contexts; mainly silicon photovoltaics (with a focus on tandems), but also on other applications such lithium ion battery anodes.
期刊论文(2)
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会议论文
Stability of industrial gallium-doped Czochralski silicon PERC cells and wafers
工业掺镓直拉硅 PERC 电池和晶圆的稳定性
DOI: 10.1016/j.solmat.2023.112645
发表时间: 2024
期刊: Solar Energy Materials and Solar Cells
影响因子: 6.9
作者: [Niewelt T]
通讯作者: Niewelt T
Activation of Al2O3 surface passivation of silicon: Separating bulk and surface effects
硅 Al2O3 表面钝化的活化:分离体效应和表面效应
DOI: 10.1016/j.apsusc.2023.158786
发表时间: 2024
期刊: Applied Surface Science
影响因子: 6.7
作者: [Grant N]
通讯作者: Grant N
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