Fundamentals of High Power Impulse Magnetron Sputtering (HIPIMS) - Plasma Studies and Materials Synthesis

高功率脉冲磁控溅射 (HIPIMS) 基础知识 - 等离子体研究和材料合成

• 批准号: EP/D049202/1
• 负责人: Arutiun Ehiasarian
• 金额: $ 24.17万
• 依托单位: Sheffield Hallam University
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2006
• 资助国家: 英国
• 起止时间: 2006 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FD049202%2F1
• 关键词: Fundamentals; Power; Impulse; Magnetron; Sputtering

To be effective, many modern technologies need component parts with very special surface properties. The parts of an F1 engine must be very resistant to wear, medical implants must not corrode inside the human body, and even everyday objects like the surface finish of glasses-frames and mobile phones must be able to survive the knocks and scratches of day-to-day life. Industry very often gets these desirable properties by taking an everyday material such steel and protecting it with a highly specialised surface coating . Our research aims to improve our understanding of an exciting new technology for producing coatings.The new method is called HIPIMS (which stands for High Power Impulse Magnetron Sputtering) and is a very recent addition to a family of plasma techniques, in which the coating is produced by bombarding the surface you want to coat with carefully prepared atoms and ions. HIPIMS was first discovered in 1995, and recent work in our group and elsewhere has already shown that it produces an excellent plasma, with a combination of ion properties which should produce hard wearing, corrosion resistant coatings. We have also made some early trials of the coatings themselves, and they do indeed turn out to be very promising.Because it is so new, there are a number of key features of HIPIMS we don't yet understand. HIPIMS works by making a series of short, very high-power pulses. We know that the plasma achieves unusual conditions during the pulse, but the details are not yet worked out. Similarly, the way the plasma changes during the pulse is not yet clear. Answering these questions would be of interest to scientists who study plasmas, and would help technologists to learn how to apply HIPIMS to create new, better coatings.In the research we will measure properties of HIPIMS plasmas to understand how the composition of the plasma changes with time. We will do this by carefully analysing the electrical properties of the plasma and studying the spectrum of the light it emits. We will feed the data into models of how HIPIMS operates and work to develop a theory which explains the pulse behaviour. We will also make coatings using HIPIMS and measure their properties (for example how hard they are) and examine them under electron microscopes to help our understanding of how the properties relate to the microscopic structure produced by the HIPIMS plasma. This understanding should help industrialists to develop HIPIMS processes which can generate new, better coatings. In a few years our car engines, hip-replacements and mobile phones may all be reliant on components developed using HIPIMS!

为了有效，许多现代技术需要具有非常特殊表面特性的零部件。F1发动机的部件必须非常耐磨，医疗植入物必须不会在人体内腐蚀，甚至像眼镜架和移动的手机的表面处理这样的日常物品也必须能够在日常生活的撞击和划痕中幸存下来。工业通常通过采用日常材料如钢并用高度专业化的表面涂层对其进行保护来获得这些理想的性能。我们的研究旨在提高我们对一种令人兴奋的涂层生产新技术的理解。这种新方法被称为HIPIMS（代表高功率脉冲磁控溅射），是等离子体技术家族的最新成员，其中涂层是通过用精心准备的原子和离子轰击想要涂覆的表面来制备的。HIPIMS于1995年首次被发现，我们小组和其他地方最近的工作已经表明，它产生了一种优异的等离子体，结合了离子特性，可以产生耐磨、耐腐蚀的涂层。我们也对涂层本身进行了一些早期试验，结果证明它们确实非常有前途。由于它是如此新，我们还不了解HIPIMS的许多关键特性。HIPIMS的工作原理是产生一系列短的高功率脉冲。我们知道等离子体在脉冲期间达到不寻常的条件，但细节还没有确定。同样，等离子体在脉冲期间的变化方式也尚不清楚。这些问题的解决将是研究等离子体的科学家们感兴趣的，并将有助于技术人员学习如何应用HIPIMS来创建新的，更好的涂层。在研究中，我们将测量HIPIMS等离子体的特性，以了解等离子体的组成如何随时间变化。我们将通过仔细分析等离子体的电学特性和研究它发出的光的光谱来做到这一点。我们将把数据输入HIPIMS如何运作的模型，并努力开发一种解释脉冲行为的理论。我们还将使用HIPIMS制作涂层，并测量它们的特性（例如它们有多硬），并在电子显微镜下对其进行检查，以帮助我们了解这些特性与HIPIMS等离子体产生的微观结构之间的关系。这种理解应该有助于工业家开发HIPIMS工艺，可以产生新的，更好的涂层。几年后，我们的汽车发动机、髋关节置换和移动的电话可能都依赖于使用HIPIMS开发的组件！

项目成果

Ion composition produced by high power impulse magnetron sputtering discharges near the substrate

• DOI: 10.1063/1.3000446
• 发表时间: 2008-10
• 期刊: Journal of Applied Physics
• 影响因子: 3.2
• 作者: A. Ehiasarian;A. Vetushka;A. Hecimovic;S. Konstantinidis

Erratum: "High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering" [J. Appl. Phys. 102, 113303 (2007)]

勘误：“高功率脉冲磁控溅射：电流-电压-时间特性表明持续自溅射的开始”[J。

• DOI: 10.1063/1.2875523
• 发表时间: 2008
• 期刊: Journal of Applied Physics
• 影响因子: 3.2
• 作者: Anders A

Ion energy distributions and efficiency of sputtering process in HIPIMS system

HIPIMS系统中溅射过程的离子能量分布和效率

• DOI: 10.1088/0022-3727/41/11/115306
• 发表时间: 2008
• 期刊: Applied Physics
• 作者: Burcalova K

High-power impulse magnetron sputtering and its applications

• DOI: 10.1351/pac-con-09-10-43
• 发表时间: 2009-06
• 期刊: Pure and Applied Chemistry
• 影响因子: 1.8
• 作者: A. Ehiasarian

High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

• DOI: 10.1063/1.2817812
• 发表时间: 2007-12-01
• 期刊: JOURNAL OF APPLIED PHYSICS
• 影响因子: 3.2
• 作者: Anders, Andre;Andersson, Joakim;Ehiasarian, Arutiun
• 通讯作者: Ehiasarian, Arutiun