Fundamentals of High Power Impulse Magnetron Sputtering (HIPIMS) - Plasma Studies and Materials Synthesis
Fundamentals of High Power Impulse Magnetron Sputtering (HIPIMS) - Plasma Studies and Materials Synthesis
批准号:
EP/D049202/1
负责人:
Arutiun Ehiasarian
金额:
$24.17万
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2006
资助国家:
英国
项目状态:
已结题
起止时间:
2006 至 --
中文摘要
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英文摘要
To be effective, many modern technologies need component parts with very special surface properties. The parts of an F1 engine must be very resistant to wear, medical implants must not corrode inside the human body, and even everyday objects like the surface finish of glasses-frames and mobile phones must be able to survive the knocks and scratches of day-to-day life. Industry very often gets these desirable properties by taking an everyday material such steel and protecting it with a highly specialised surface coating . Our research aims to improve our understanding of an exciting new technology for producing coatings.The new method is called HIPIMS (which stands for High Power Impulse Magnetron Sputtering) and is a very recent addition to a family of plasma techniques, in which the coating is produced by bombarding the surface you want to coat with carefully prepared atoms and ions. HIPIMS was first discovered in 1995, and recent work in our group and elsewhere has already shown that it produces an excellent plasma, with a combination of ion properties which should produce hard wearing, corrosion resistant coatings. We have also made some early trials of the coatings themselves, and they do indeed turn out to be very promising.Because it is so new, there are a number of key features of HIPIMS we don't yet understand. HIPIMS works by making a series of short, very high-power pulses. We know that the plasma achieves unusual conditions during the pulse, but the details are not yet worked out. Similarly, the way the plasma changes during the pulse is not yet clear. Answering these questions would be of interest to scientists who study plasmas, and would help technologists to learn how to apply HIPIMS to create new, better coatings.In the research we will measure properties of HIPIMS plasmas to understand how the composition of the plasma changes with time. We will do this by carefully analysing the electrical properties of the plasma and studying the spectrum of the light it emits. We will feed the data into models of how HIPIMS operates and work to develop a theory which explains the pulse behaviour. We will also make coatings using HIPIMS and measure their properties (for example how hard they are) and examine them under electron microscopes to help our understanding of how the properties relate to the microscopic structure produced by the HIPIMS plasma. This understanding should help industrialists to develop HIPIMS processes which can generate new, better coatings. In a few years our car engines, hip-replacements and mobile phones may all be reliant on components developed using HIPIMS!
期刊论文(10)
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DOI:
10.1063/1.3000446
发表时间:
2008-10
期刊:
Journal of Applied Physics
影响因子:
3.2
作者:
[A. Ehiasarian;A. Vetushka;A. Hecimovic;S. Konstantinidis]
通讯作者:
A. Ehiasarian;A. Vetushka;A. Hecimovic;S. Konstantinidis
Erratum: "High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering" [J. Appl. Phys. 102, 113303 (2007)]
勘误:“高功率脉冲磁控溅射:电流-电压-时间特性表明持续自溅射的开始”[J。
DOI:
10.1063/1.2875523
发表时间:
2008
期刊:
Journal of Applied Physics
影响因子:
3.2
作者:
[Anders A]
通讯作者:
Anders A
Ion energy distributions and efficiency of sputtering process in HIPIMS system
HIPIMS系统中溅射过程的离子能量分布和效率
DOI:
10.1088/0022-3727/41/11/115306
发表时间:
2008
期刊:
Applied Physics
影响因子:
--
作者:
[Burcalova K]
通讯作者:
Burcalova K
DOI:
10.1351/pac-con-09-10-43
发表时间:
2009-06
期刊:
Pure and Applied Chemistry
影响因子:
1.8
作者:
[A. Ehiasarian]
通讯作者:
A. Ehiasarian
DOI:
10.1063/1.2817812
发表时间:
2007-12-01
期刊:
JOURNAL OF APPLIED PHYSICS
影响因子:
3.2
作者:
[Anders, Andre, Andersson, Joakim, Ehiasarian, Arutiun]
通讯作者:
Ehiasarian, Arutiun
共 9 条
Robust manufacturable antimicrobial surfaces enabled by superhard plasmon-enhanced photocatalytic materials
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批准号:EP/W009501/1
-
项目类别:Research Grant
-
资助金额:$99.27万
-
财政年份:2022
-
负责人:Arutiun Ehiasarian
-
依托单位:
High Efficiency CuInSe2 Photovoltaic Modules Deposited at Low Temperature by High Power Impulse Magnetron Sputtering (HIPIMS)
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项目类别:Research Grant
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资助金额:$41.94万
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财政年份:2012
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负责人:Arutiun Ehiasarian
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依托单位:
国内基金
海外基金
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