Cluster Ion Sources for ToF-SIMS
用于 ToF-SIMS 的簇离子源
基本信息
- 批准号:8246268
- 负责人:
- 金额:$ 37.46万
- 依托单位:
- 依托单位国家:美国
- 项目类别:
- 财政年份:2012
- 资助国家:美国
- 起止时间:2012-05-04 至 2013-05-03
- 项目状态:已结题
- 来源:
- 关键词:AntibodiesBiocompatible MaterialsBiologicalBiosensorCarbohydratesCellsChemicalsDNADevicesFundingGrantIonsManufacturer NameMethodsMicrobial BiofilmsMolecularMolecular StructurePharmaceutical PreparationsResearch Project GrantsResolutionSamplingSourceSpecificitySpectrometry, Mass, Secondary IonStentsSurfaceTechniquesThree-Dimensional ImagingTimeTissue EngineeringTissuesUnited States National Institutes of HealthUniversitiesWashingtonimprovedinstrumention sourcemedical implantscaffold
项目摘要
DESCRIPTION (provided by applicant): Many important cell and tissue functions depend on the surface presentation of molecules, so it is critical to determine the chemical state (composition, molecular structure, and orientation) as well as the distribution of biological moieties present on a surface and in the near surface region of biomedical devices. Thus, it is essential to develop surface analysis techniques capable of providing quantitative and detailed surface chemical state information at high spatial resolutions, both for 2-D and 3-D imaging of biological materials. Time-of-flight secondary ion mass spectrometry (ToF-SIMS), with its high chemical specificity and spatial resolution, is an excellent method for obtaining this information.
However, until commercial cluster ion beam sources became readily available in the last 5-10 years, ToF-SIMS analysis was limited to analyzing the outer ~2nm of biological materials. This is because the commercial high-energy, monoatomic ion sources available on the initial ToF-SIMS instruments (Ga+, Cs+, etc.) resulted in significant sample degradation and loss of molecular information during sputtering. Several years ago commercial cluster ion sources such C60+ became available. These sources were capable of molecular depth profiling of biological materials and opened the possibility of 3-D imaging with ToF-SIMS. In late 2010 the manufacturer of our ToF-SIMS instrument at the University of Washington (IONTOF) introduced two new cluster ion beam sources for their TOF.SIMS 5 instrument (a new Ar cluster ion source and significantly upgraded C60 cluster ion source). The Ar cluster ion source offers significant advantages over previous cluster ion sources (significantly improved depth resolution and applicability to a wider range of materials). The new C60 cluster ion source offers significant improvements over our existing C60 source (2x increase in ion energy, as well as significant enhancements in both mass and spatial resolution). To capitalize on these new capabilities and the benefits they will provide to NIH- funded research projects, we are requesting $374,604.80 to upgrade our existing IONTOF TOF.SIMS 5 instrument with the new cluster ion beam sources. The National ESCA and Surface Analysis Center for Biomedical Problems (NESAC/BIO, NIH grant EB-002027) will provide an additional $50,000 for the purchase of these ion sources. Research projects that will benefit from the new capabilities of the Ar and C60 cluster ion beam sources include analysis of medical implants (e.g., drug-loaded/coated stents), biofilms, cell sheets, tissue sections, tissue engineering scaffolds, microarray devices (DNA, antibody, carbohydrate, etc.), biosensors, etc.
PUBLIC HEALTH RELEVANCE: Knowledge about biomedical implant surfaces and an understanding of how these surfaces interact and direct biological processes when such a device is placed in the body is needed to permit the rational design of new and improved biomedical implants. The proposed cluster ion beam sources will provide new information about the surface properties of biomedical devices,
as well as the biomolecules and cells interacting with those devises, that is needed to achieve this objective.
描述(由申请人提供):许多重要的细胞和组织功能取决于分子的表面呈现,因此确定生物医学器械表面和近表面区域中存在的生物部分的化学状态(组成、分子结构和取向)以及分布至关重要。因此,它是必不可少的,以发展表面分析技术,能够提供定量和详细的表面化学状态信息,在高空间分辨率,无论是2-D和3-D成像的生物材料。飞行时间二次离子质谱(ToF-SIMS),以其高的化学特异性和空间分辨率,是一个很好的方法来获得这些信息。
然而,直到商业团簇离子束源在过去的5-10年中变得容易获得,ToF-SIMS分析仅限于分析生物材料的外部~2nm。这是因为最初的ToF-SIMS仪器上可用的商业高能单原子离子源(Ga+、Cs+等)导致在溅射过程中显著的样品降解和分子信息的损失。几年前,商业簇离子源如C60+变得可用。这些光源能够对生物材料进行分子深度分析,并开启了ToF-SIMS三维成像的可能性。2010年末,华盛顿大学(IONTOF)的ToF-SIMS仪器制造商为其TOF.西姆斯5仪器引入了两个新的团簇离子束源(一个新的Ar团簇离子源和一个显著升级的C60团簇离子源)。Ar团簇离子源比以前的团簇离子源具有显著的优势(显著提高的深度分辨率和对更广泛材料的适用性)。新的C60团簇离子源比我们现有的C60源有了显著的改进(离子能量增加了2倍,质量和空间分辨率也有了显著提高)。为了充分利用这些新的能力以及它们将为NIH资助的研究项目提供的好处,我们申请了374,604.80美元,用于使用新的团簇离子束源升级我们现有的IONTOF TOF.西姆斯5仪器。国家ESCA和生物医学问题表面分析中心(NESAC/BIO,NIH拨款EB-002027)将提供额外的50,000美元用于购买这些离子源。将受益于Ar和C60团簇离子束源的新能力的研究项目包括分析医疗植入物(例如,载药/涂层支架)、生物膜、细胞片、组织切片、组织工程支架、微阵列装置(DNA、抗体、碳水化合物等),生物传感器等。
公共卫生关系:生物医学植入物表面的知识和了解这些表面如何相互作用,并直接生物过程时,这种设备被放置在体内是需要允许新的和改进的生物医学植入物的合理设计。提出的团簇离子束源将提供有关生物医学器件表面特性的新信息,
以及与这些装置相互作用的生物分子和细胞,这是实现这一目标所需要的。
项目成果
期刊论文数量(2)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Biomedical surface analysis: Evolution and future directions (Review).
- DOI:10.1116/1.4982169
- 发表时间:2017-04-24
- 期刊:
- 影响因子:2.1
- 作者:Castner DG
- 通讯作者:Castner DG
Photo-induced halide redistribution in organic-inorganic perovskite films.
- DOI:10.1038/ncomms11683
- 发表时间:2016-05-24
- 期刊:
- 影响因子:16.6
- 作者:deQuilettes DW;Zhang W;Burlakov VM;Graham DJ;Leijtens T;Osherov A;Bulović V;Snaith HJ;Ginger DS;Stranks SD
- 通讯作者:Stranks SD
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DAVID G CASTNER其他文献
DAVID G CASTNER的其他文献
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{{ truncateString('DAVID G CASTNER', 18)}}的其他基金
Nanoscale Investigation of Protein-Surface Interactions
蛋白质-表面相互作用的纳米级研究
- 批准号:
7578839 - 财政年份:2006
- 资助金额:
$ 37.46万 - 项目类别:
Nanoscale Investigation of Protein-Surface Interactions
蛋白质-表面相互作用的纳米级研究
- 批准号:
7176171 - 财政年份:2006
- 资助金额:
$ 37.46万 - 项目类别:
Nanoscale Investigation of Protein-Surface Interactions
蛋白质-表面相互作用的纳米级研究
- 批准号:
7038736 - 财政年份:2006
- 资助金额:
$ 37.46万 - 项目类别:
Nanoscale Investigation of Protein-Surface Interactions
蛋白质-表面相互作用的纳米级研究
- 批准号:
7350156 - 财政年份:2006
- 资助金额:
$ 37.46万 - 项目类别:
Clinical Research Experience for Engineers (CREE)(RMI)
工程师临床研究经验 (CREE)(RMI)
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- 资助金额:
$ 37.46万 - 项目类别:
Clinical Research Experience for Engineers (CREE)(RMI)
工程师临床研究经验 (CREE)(RMI)
- 批准号:
6951457 - 财政年份:2004
- 资助金额:
$ 37.46万 - 项目类别:
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