High power impulse magnetron sputtering (HIPIMS)

新的应用领域对涂层材料性能和薄膜合成技术的要求不断提高，推动了先进沉积方法的发展。其中，高功率脉冲磁控溅射（HIPIMS）是最近提出的并且非常有前途的用于物理气相沉积（PVD）的新兴技术。在不使靶过热的情况下，高等离子体密度可以通过在低占空比（MW范围内）下在单个脉冲内施加非常高的功率来实现，从而在阴极表面上产生几kW/cm 2的峰值功率和高达90%的电离度，产生比常规DC磁控管放电高2至3个数量级的等离子体密度。这在磁控溅射中开辟了新的途径，特别是提供非常致密的膜（100%的堆积密度）、低应力和对工业基底的优异粘附。在这个RTI竞争中，我们寻求资助收购HIPIMS电源，以支持我们对新型纳米结构光学，摩擦和保护涂层的合成研究，用于航空航天，光子学，生物医学和先进制造应用。

Ever increasing requirements on the coating material properties and the thin film synthesis techniques for new fields of application drive the development of advanced deposition methods. Among these, High Power Impulse Magnetron Sputtering (HIPIMS) is a very recently proposed and highly promising emerging technology for physical vapor deposition (PVD). High plasma density, without overheating the target, can be achieved by applying a very high power within individual pulses at low duty cycle (in the MW range), giving rise to a peak power on the cathode surface of several kW/cm2, and a degree of ionization of up to 90%, yielding plasma densities 2 to 3 orders of magnitude higher than in a conventional DC magnetron discharge. This opens new avenues in magnetron sputtering, in particular providing very dense films (packing density of 100%), low stress and excellent adhesion to industrial substrates. Within this RTI competition, we seek funding for the acquisition of a HIPIMS power supply in support of our research on the synthesis of new nanostructured optical, tribological and protective coatings for their use in aerospace, photonics, biomedical and advanced manufacturing applications.