Power supply infrastructure for a pulsed water-wall arc lamp

脉冲水冷壁弧光灯的供电基础设施

• 批准号: 412167-2010
• 负责人: Dawson, Francis
• 金额: $ 1.82万
• 依托单位: University of Toronto
• 依托单位国家: 加拿大
• 项目类别: Engage Grants Program
• 财政年份: 2010
• 资助国家: 加拿大
• 起止时间: 2010-01-01 至 2011-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=473220
• 关键词: Power; supply; infrastructure; pulsed; water

Mattson Technology has developed a water wall vortex arc lamp technology which can be used for flash assisted rapid thermal processing (fRTP) and the rapid heating of a silicon wafer surface. Wafer heating is used for a number of different applications including the creation of ultra-shallow junctions, defect annealing, and NiPtSi phase changes. Four lamps whose current pulses can be staggered in time and shaped appropriately are required to accomplish this task. The current profiles of each lamp have been optimized to meet the following dual criteria; constant temperature and minimal wafer vibrations. Each of the lamps is powered by a number of power supplies however the power supply infrastructure for each lamp is similar; one power supply is used to ignite the lamp, a second power supply is used to sustain and ramp the current in the lamp, and a third power supply is used to pulse the lamp to currents which are in excess of 10,000 A for a period in the order of milliseconds.

Mattson Technology开发了一种水壁涡弧灯技术，可用于闪光辅助快速热处理（fRTP）和硅晶圆表面的快速加热。晶圆加热用于许多不同的应用，包括创建超浅结，缺陷退火和NiPtSi相变。完成这一任务需要四个灯，它们的电流脉冲可以在时间上错开，并且形状适当。每盏灯的电流轮廓都经过优化，以满足以下双重标准；温度恒定，晶圆振动最小。每个灯由多个电源供电，但每个灯的供电基础设施是相似的；一个电源用于点燃灯，第二个电源用于维持和倾斜灯中的电流，第三个电源用于将灯脉冲到超过10,000 a的电流，持续时间以毫秒为单位。