Power supply infrastructure for a pulsed water-wall arc lamp

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Mattson Technology has developed a water wall vortex arc lamp technology which can be used for flash assisted rapid thermal processing (fRTP) and the rapid heating of a silicon wafer surface. Wafer heating is used for a number of different applications including the creation of ultra-shallow junctions, defect annealing, and NiPtSi phase changes. Four lamps whose current pulses can be staggered in time and shaped appropriately are required to accomplish this task. The current profiles of each lamp have been optimized to meet the following dual criteria; constant temperature and minimal wafer vibrations. Each of the lamps is powered by a number of power supplies however the power supply infrastructure for each lamp is similar; one power supply is used to ignite the lamp, a second power supply is used to sustain and ramp the current in the lamp, and a third power supply is used to pulse the lamp to currents which are in excess of 10,000 A for a period in the order of milliseconds.