Nanoscale structure and device fabrication by nanoimprint lithography

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Nanoscale science and technology is one of the fastest growing research areas in recent years. Nanostructures or devices are typically fabricated by lithography, etching and thin film deposition techniques. Among various nano-lithographic technologies, nanoimprint lithography (NIL) is the choice for high throughput patterning of nanostructures. Similar to CD/DVD duplication process, it is based on mechanical hot embossing principle onto thermoplastic polymers that become soft when heated (thermal NIL). Another popular form of NIL is based on ultraviolet light curing and hardening of a mixture called resist that consists of pre-polymers and additives (UV-NIL). Besides its high throughput, NIL has ultra high resolution of sub-5 nanometers, which is beyond the limitations set by light diffraction as in photolithography or beam scattering as in electron beam lithography. Therefore, NIL is considered as the most suitable lithography for mass production of many nano-devices.