Nanoscale structure and device fabrication by nanoimprint lithography

通过纳米压印光刻技术制造纳米级结构和器件

• 批准号: 372791-2009
• 负责人: Cui, Bo
• 金额: $ 1.53万
• 依托单位: University of Waterloo
• 依托单位国家: 加拿大
• 项目类别: Discovery Grants Program - Individual
• 财政年份: 2013
• 资助国家: 加拿大
• 起止时间: 2013-01-01 至 2014-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=528559
• 关键词: Nanoscale; structure; device; fabrication; nanoimprint

Nanoscale science and technology is one of the fastest growing research areas in recent years. Nanostructures or devices are typically fabricated by lithography, etching and thin film deposition techniques. Among various nano-lithographic technologies, nanoimprint lithography (NIL) is the choice for high throughput patterning of nanostructures. Similar to CD/DVD duplication process, it is based on mechanical hot embossing principle onto thermoplastic polymers that become soft when heated (thermal NIL). Another popular form of NIL is based on ultraviolet light curing and hardening of a mixture called resist that consists of pre-polymers and additives (UV-NIL). Besides its high throughput, NIL has ultra high resolution of sub-5 nanometers, which is beyond the limitations set by light diffraction as in photolithography or beam scattering as in electron beam lithography. Therefore, NIL is considered as the most suitable lithography for mass production of many nano-devices.

纳米科学技术是近年来发展最快的研究领域之一。纳米结构或器件通常由光刻、蚀刻和薄膜沉积技术制造。在各种纳米光刻技术中，纳米压印技术是高通量纳米结构图像化的首选技术。与CD/DVD复制过程类似，它基于热塑性聚合物的机械热压印原理，当加热时变得柔软（热零）。另一种流行的NIL形式是基于紫外光固化和硬化的混合物，称为抗蚀剂，由预聚合物和添加剂（UV-NIL）组成。除了高通量外，NIL还具有低于5纳米的超高分辨率，这超出了光刻中的光衍射或电子束光刻中的光束散射的限制。因此，NIL被认为是最适合大量生产纳米器件的光刻技术。