Fabrication of sub-wavelength nanostructure array for optical filter applications

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Optical filter is an essential component for optoelectronic and photonic devices. One issue is that, when light strikes an optical filter surface from air, some of the light is reflected back into the air which is an optical loss for the desired wavelength and an undesirable effect. To counter this effect, the supporting company, Iridian, currently applies anti-reflective coatings on the filter surface to reduce reflection and allow as much of the desired light to pass through. This approach works fairly well in the visible and near infra-red wavelength range for some applications including fiber optics telecommunications, analytical equipment, and multi-dimensional cameras. Anti-reflective coatings however, can be time-consuming and challenging because of complex multiple layer designs and material limitations for longer wavelengths used in applications such as night vision cameras and remote sensing for security and military purposes, and gas sensors for hazardous gas detections. The available materials are very limited for anti-reflective coatings in the medium and far infra-red wavelength range because of the optical loss from light absorptions. Alternative and advanced technologies for making anti-reflective materials are highly desired. In this project, Iridian will leverage Dr. Cui's expertise in the nanofabrication capabilities at University of Waterloo in developing nanoscale surface materials using nanoimprint technology to address the challenges associated with anti-reflecting coating in these spectrums. Nanoimprint lithography promises the possibility of eliminating the need for costly coatings by offering extremely high resolution, low cost, and high throughput, thus fits perfectly for the nanostructure fabrication. Therefore, this project will focus on the fabrication of nanostructure surface using nanoimprint lithography and thin film etching techniques for optical filter application.