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Enhancing conductivity of laser fabricated porous silicon substrates with Graphene and Metal by Atomic Layer Deposition (ALD)

Enhancing conductivity of laser fabricated porous silicon substrates with Graphene and Metal by Atomic Layer Deposition (ALD)
通过原子层沉积 (ALD) 增强激光制造的石墨烯和金属多孔硅基底的导电性
批准号:
516414-2017
负责人:
Kiani, Amirkianoosh
金额:
$1.82万
依托单位国家:
加拿大
项目类别:
Engage Grants Program
财政年份:
2017
资助国家:
加拿大
项目状态:
已结题
起止时间:
2017-01-01 至 2018-12-31

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英文摘要
In this project, we introduce a new method for laser-based fabrication of nanofibrous silicon structures induced by laser pulses. Single crystalline silicon wafers are laser processed using a pulsed nanosecond laser system at different laser parameters before undergoing metallic and graphene Atomic Layer Deposition (ALD).Based on previous studies, when processed to be nanofibers, Si has shown promising biocompatibility; however, its conductivity is reduced due to oxidization. To overcome this, conductive biomaterial (e.g., gold, platinum, graphene, silver) embedding through ALD is proposed in this research as a means of controlling and further imparting electrical properties to laser-induced silicon oxide nanofibers. The metallic infused samples result in greater conductivities at higher embedded nanomaterial concentrations, especially in samples with smaller fiber sizes.The process developed through this research project will produce commercial quality sensors for IoT applications including health monitoring. The product can be used in data-centre interconnect with optical devices.
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