Nanoscale Direct-Write Machining using Focused Ion Beams

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Focused Ion Beams are powerful tools for machining materials at the nanoscale with high resolution. This study proposes to**compare tradition FIB direct-write patterning using gallium beams to newer ion sources such as xenon, helium and neon.**Understanding how these mill is a series of benchmark performance studies, on important samples such as silicon, polycrystalline**Al, Ni and Ze, and III-V semiconductors help creates data that allows further optimization of FIB microscopes. By comparing**milling features as a function of beam parameters, such as beam voltage and current, we can compare this information to existing**simulations of ion-solid interactions and then prescribe a method to optimize nanomachining for higher resolution, maximum**material removal rate, or minimal beam damage.