Research Initiation: Negative Ion and Modulated Discharge Processing Studies (REU SUPPLEMENT)

这项工作有四个主要目标。首先是为了更好地理解一种用于射频处理放电的新的负离子诊断程序。这项技术是基于直接离子质谱法。第二个目标是使用这种诊断来探测技术上重要的放电，并确定负离子的身份和对外部控制参数的依赖关系。这些信息将用于提供对放电中负离子动力学和传输的更完整的理解。负离子正在被研究，以确定它们是否有助于在排放中产生气相微粒（微污染）。这种污染会增加半导体器件的故障率。第四个目标是开始研究负离子是否比正离子更好地蚀刻或沉积材料。为了实现本研究的目标，将结合对放电中中性和离子的质谱测量，以及电子密度的微波测量和辐射物质的光学测量。

There are four main objectives to this work. The first is to provide a better understanding of a new negative ion diagnostic procedure for radio-frequency processing discharges. This technique is based upon direct ion mass spectrometry. The second objective is to use this diagnostic to probe technologically important discharges and determine the negative ions identities and dependencies on externally controlled parameters. This information will be used to provide a more complete understanding of negative ion kinetics and transport in the discharge. Negative ions are being studied to determine whether or not they help to produce gas-phase particulates (microcontamination) in the discharge. This contamination can increase the failure rate of semiconductor devices. The fourth objective is to begin to investigate whether or not negative ions etch or deposit materials better than their positive counterparts. Mass spectrometric measurements of the neutrals and ions in the discharge in conjunction with microwave measurements of the electron density and optical measurements of radiating species will be combined to achieve the goals for this research.