X-ray Mask Fabrication Using Diamond Membranes and Metallic Diamondlike Nanocomposite Absorbers

其中一个主要的限制因素， X射线光刻的发展是 缺乏最佳掩模材料。 的 X射线和 光学透明度，韧性，高 屈服强度和足够的内部 强调保持平整度，限制 候选材料清单 膜。 的各种材料中的 在过去几年里， 钻石是一个非常好的候选人 做X射线膜 X光面罩 结构需要形成一个 极高的附着力，高原子序数 膜上的吸收剂。 在同一 时间吸收层不应该 产生内应力 沉积，因为这将导致图案 后续蚀刻后的畸变 和加工步骤。 金属 类金刚石纳米复合材料可以 合成几乎无压力， 表现出极好的粘附性， 几乎任何衬底。 I期 该提案旨在优化合成 X射线掩模结构， 金刚石膜和类金刚石膜 纳米复合吸收剂

One of the major limiting factors in the development of X-ray lithography is the lack of an optimum mask material. The combined requirements of X-ray a nd optical transparency, toughness, high yield strength and sufficient internal stress to maintain flatness, limit the list of candidate materials for membranes. Of the various materials studied over the past several years diamond is an extremely good candidate for an X-ray membrane. The X-ray mask structure requires the formation of an extremely adherent, high atomic number absorber on the membrane. At the same time the absorber layer should not develop internal stresses during deposition as this will lead to pattern distortions following subsequent etching and processing steps. Metallic diamondlike nanocomposites can be synthesized virtually stress-free and exhibit extremely good adhesion to virtually any substrate. The phase I proposal seeks to optimize the synthesis of X-ray mask structures consisting of a diamond membrane and a W-diamondlike nanocomposite absorber.