Advanced Novolak Resins for Electronic Applications

Microlithography Chemical Company计划进行一项合成研究计划，以探索一种新的合成和制造方法，以开发用于微电子，印刷电路板和LCD应用的先进novolak树脂。更准确地说，科学设计的novolak树脂具有优越的性能和可重复性，特别适用于正极光刻胶将进行评估。这些树脂将根据最近发表的关于novolaks和抗蚀剂光敏成分之间氢键相互作用的研究成果来设计。它们还将被设计成具有更高的溶解速率、更好的热稳定性、更好的批对批再现性和非常低的金属离子污染。我们计划开展一个实验项目并开发一种新的合成方法，制备离散的低分子量低聚物组分，并将这些低聚物转化为一系列嵌段共聚物树脂，以评估相关性能。MCC将开展一项计划，该计划将导致固体novolak树脂的开发，其金属离子含量低于100 ppb，批间重复性为10%，并且能够提供优于0.5 >m的分辨率，大约100 mJ/cm2的阈值能量，以及至少130>C的热稳定性。

Microlithography Chemical Company plans to conduct a synthetic research program to explore a new synthetic and manufacturing approach for the development of advanced novolak resins for microelectronic, printed circuit board, and LCD applications. More precisely, an evaluation of scientifically designed novolak resins with superior properties and reproducibility, specifically applicable for use in positive photoresists will be undertaken. These resins would be designed based on recently published work on the hydrogen bonding interactions between novolaks and photosensitive components of the resist. They would also be designed to give higher dissolution rates, improved thermal stability, better batch-to-batch reproducibility, and very low metal ion contamination. We plan to undertake an experimental program and develop a new synthetic approach, prepare discrete low MW oligomeric components, and to convert these oligomers into a series of block copolymer resins to be evaluated for relevant performance. MCC will carry out a program which could lead to the development of solid novolak resins with less than 100 ppb metal ion and > 10% batch-to-batch reproducibility, and which are capable of providing resists with better than 0.5 >m resolution, approximately 100 mJ/cm2 threshold energy, and at least 130>C thermal stability.