High Concentration Ozone Production for Semiconductor Manufacturing
High Concentration Ozone Production for Semiconductor Manufacturing
批准号:
9307481
负责人:
Melvin Piestrup
金额:
$30.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-04-15 至 1998-06-30
中文摘要
研究工作的目标是开发紧凑, 一种能在很高的温度下产生臭氧的高效设备, 用于半导体制造和材料的浓度 加工业。 利用臭氧的新兴工艺技术 化学创造了对这种设备的需求。 一种新型 在第一阶段建造的实验发电机产生了很高的 臭氧浓度的三倍产量(效率) 传统发电机 全尺寸发电机, 新设计的尺寸预计是传统设计的四分之一 发生器. 第二阶段研究的四个目标是 建造一个新的实验室规模的发电机, 第一阶段研究建议的设计改进 利用实验室规模的发生器,探索几个 获得额外产量改进的有希望的方法, 设计和建造商业规模的发电机,增加 具有额定功率的模块化臭氧发生系统的设计 生产能力2至8公斤/天,10%至15% 浓度. 如果成功,这项研究将导致开发 一种关键的制造资源,用于制造 下一代半导体器件。
英文摘要
The objective of the researched work is to develop compact, efficient equipment capable of generating ozone at very high concentrations for the semiconductor manufacturing and materials processing industry. Emerging process technologies using ozone chemistry have created the need for such equipment. A novel experimental generator, constructed in phase I, has produced high concentration ozone at three times the yield (efficiency) of conventional generators. Full scale generators incorporating this novel design are expected to be one-forth the size of conventional generators. The four goals for the phase II research are construction of a new laboratory scale generator which incorporates the design improvements suggested by the phase I research utilization of the laboratory scale generator to explore several promising approaches to obtaining additional yield improvements, design and construction of a commercial scale generator, added design of modular ozone generation systems with a nominal production capacity of 2 to 8 kgm/day at 10 to 15 percent concentration. If successful, this research will lead to the development of a critical manufacturing resource for use in the fabrication of the next generation of semiconductor devices.
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会议论文
SBIR Phase I: Synchrotron Mimic for Lithography
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批准号:0214819
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项目类别:Standard Grant
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资助金额:$10.0万
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财政年份:2002
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负责人:Melvin Piestrup
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依托单位:
A Collimated X-Ray Lithography Source Using a Kumakhov Lens
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批准号:9303184
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项目类别:Standard Grant
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资助金额:$30.0万
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财政年份:1995
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负责人:Melvin Piestrup
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依托单位:
A Collimated X-Ray Lithography Source Using a Kumakhov Lens
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批准号:9160568
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1992
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负责人:Melvin Piestrup
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依托单位:
Superlattice Channeling Radiation as an Intense, Quasi- Monochromatic X-Ray Source
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批准号:9060218
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1991
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负责人:Melvin Piestrup
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依托单位:
A Multilayer Mirror/Monochromator for Dual-Energy Digital Subtraction Angiography
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批准号:9023317
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项目类别:Standard Grant
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资助金额:$26.86万
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财政年份:1991
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负责人:Melvin Piestrup
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依托单位:
A Multilayer Mirror/Monochromator For Dual-Energy Digital Subtraction Angiography
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批准号:8960373
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1990
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负责人:Melvin Piestrup
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依托单位:
A Soft X-ray Source with Focusing Optics for Spectroscopy
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批准号:8821888
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项目类别:Standard Grant
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资助金额:$22.5万
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财政年份:1989
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负责人:Melvin Piestrup
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依托单位:
A Soft X-ray Source with Focusing Optics for Spectroscopy
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批准号:8760593
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1988
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负责人:Melvin Piestrup
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依托单位:
A Real-Time Energy Detector for Relativistic Charged Particles (Physics)
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批准号:8760764
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1988
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负责人:Melvin Piestrup
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依托单位:
The Application of Transition Radiation to Non-invasive Angiography (Physics)
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批准号:8521270
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项目类别:Standard Grant
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资助金额:$22.44万
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财政年份:1987
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负责人:Melvin Piestrup
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依托单位:
The Application of Transition Radiation to Non-invasive Angiography (Physics)
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批准号:8460914
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项目类别:Standard Grant
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资助金额:$3.98万
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财政年份:1985
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负责人:Melvin Piestrup
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依托单位:
国内基金
海外基金
Ozone基于Nrf2/HO-1/HIP-2α通路双靶点改善主动脉夹层CPB术后低氧肺损伤
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批准号:81900369
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项目类别:青年科学基金项目
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资助金额:20.0万元
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批准年份:2019
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负责人:邓丽
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依托单位: