Directed Chemical Deposition of Microstructures

这三个部分的研究项目，研究化学气相沉积过程的细节是在分析和表面化学程序的支持。 它是在伊利诺伊大学厄巴纳分校尚潘的努佐教授的实验室里进行的。 新的方法被开发用于直接沉积亚微米结构，使用溶胶-凝胶化学、图案化金属化和图案化催化聚合的组合。 分子束沉积加上吸附的中间体的表面光谱表征是用来表征的CVD生长过程的细节。 自组装有机薄膜的相行为是本项目第三部分的重点。 本研究成果对纳米加工技术和电子器件制备技术的发展具有一定的指导意义。 了解电子感兴趣的材料薄膜的合成和生长的细节是这个研究项目的重点。 自组装有机覆盖层，溶胶-凝胶化学，化学气相沉积联合收割机的详细动力学研究相结合，以提供必要的知识基础，应用新的薄层生长方法制备材料的微结构。 电子设备处理技术受到这项工作的影响。

This three part research project to study the details of chemical vapor deposition processes is supported in the Analytical and Surface Chemistry Program. It is carried out in the laboratory of Professor Nuzzo at the University of Illinois-Urbana Champaign. New methods are developed for the direct deposition of sub-micron structures, using a combination of sol-gel chemistry, patterned metallization, and patterned catalyzed polymerization. Molecular beam deposition coupled with surface spectroscopic characterization of adsorbed intermediates is used to characterize the details of the CVD growth process. Phase behavior in self assembled organic thin films forms the focus of the third part of this project. The results of this research are applicable to the developing technologies of nanoscale fabrication and electronic device preparation. Understanding the details of the synthesis and growth of thin films of electronically interesting materials is the focus of this research project. Self assembled organic overlayers, sol-gel chemistry, and detailed kinetic studies of chemical vapor deposition combine to provide the knowledge base essential to apply new thin layer growth methods to the preparation of material microstructures. Electronic device processing technologies are impacted by this work.