Acquisition of Equipment to Upgrade a Laser Deposition System for Materials Synthesis and Student Training

卡罗琳·罗斯这个奖项将使研究人员能够升级麻省理工学院已经建立的脉冲激光沉积系统(PLD)。PLD是一种强大而灵活的工具，可用于沉积具有复杂化学计量比的氧化物或合金等材料。PLD对材料合成特别有用，因为它具有快速成型材料的能力，并且可以通过改变沉积条件、温度、环境气体环境和离子轰击的量来对材料的成分和结构进行大量控制。PLD系统由高功率准分子激光器组成，用于在真空中烧蚀目标，产生的通量收集在衬底上形成薄膜。麻省理工学院的PLD系统是由IBM捐赠的，已有10年的历史。它有八个靶子，以及用于引入反应气体、原位退火和离子轰击的设施。然而，需要对激光器进行重大改进，以使其在未来十年为广泛的用户群所用。升级后的系统将极大地增强薄膜制造设施以及为广大跨学科用户提供的教育和培训机会。*该奖项是为了表彰脉冲激光沉积系统(PLD)的升级，该系统用于制造各种材料的薄膜。这些薄膜在一系列微电子设备中有应用，例如在光学设备、气体传感器和存储器中。PLD特别适用于探索各种各样的材料，使新材料和结构的快速成型得以进行。这些设备将由一群来自麻省理工学院、哈佛大学和其他机构的教职员工和学生使用。他们将大大受益于增强的PLD能力，在进行薄膜生长和演变的基础研究方面，在开发用于设备应用的新材料和工艺方面，以及在培训学生薄膜科学和技术方面。%%%

0076305Caroline Ross This award will enable the investigators to upgrade a Pulsed Laser Deposition system (PLD) which is already established in MIT. PLD is a powerful and flexible tool for deposition of materials such as oxides or alloys with complex stoichiometries. PLD is particularly useful for materials synthesis because of its ability for rapid prototyping of materials and the large amount of control which can be exercised over material composition and structure by varying the deposition conditions, temperature, ambient gas environment and amount of ion bombardment. A PLD system consists of a high power excimer laser which is used to ablate a target in vacuum, and the resulting flux is collected on a substrate to form a thin film. The PLD system at MIT was donated by IBM and is 10 years old. It has eight targets, and facilities for introduction of reactive gases, in-situ annealing and ion bombardment. However, significant improvements to the laser are needed in order to make it useful to a broad base of users over the next decade. The upgraded system will significantly enhance the thin film fabrication facilities and the educational and training opportunities available to a large, interdisciplinary base of users.***This award is for the upgrade of a Pulsed Laser Deposition system (PLD) which is used for making thin films of various materials. These thin films have applications in a range of microelectronic devices, for instance in optical devices, gas sensors, and memories. PLD is particularly useful for exploring a wide variety of materials, allowing rapid proptotyping of new materials and structures to be carried out. The equipment will be used by a group of faculty and students from MIT, Harvard and other institutions. They will benefit substantially from the enhanced PLD capabilities, in terms of performing basic research on film growth and evolution, in developing new materials and processes for device applications, and in training students in thin film science and technology. %%%