NER: Atomic Lithography of Arbitrary Two-Dimensional Nanostructures

该提案是根据NSE， NSF 01-157收到的。该项目的重点是开发一种结构原子沉积和光刻的新方法。用驻波光场聚焦中性原子束的光刻技术在纳米级制造中显示出巨大的前景。然而，该方法迄今为止仅限于空间周期模式的生产，这极大地限制了该技术的多功能性。在这种新方法中，将使用一种合成光诱导透镜的新方法，该方法允许在平面的任意位置产生单个局部光斑。使用空间光调制器可以在没有机械运动的情况下扫描光斑，这样就可以产生任意的二维图案。该项目由数学和物理科学理事会物理和材料研究部联合资助。

This proposal was received in response to NSE, NSF 01-157. The project focuses on the development of a new approach to structured atomic deposition and lithography. Lithography using neutral atom beams focused by standing wave light fields shows great promise for nanoscale fabrication. However, the method has so far been limited to the production of spatially periodic patterns, which greatly limits the versatility of the technique. In this new approach a new method of synthesizing light induced lenses which permit the creation of a single localized spot at an arbitrary position in the plane will be used. The spot can be scanned without mechanical motion using spatial light modulators, such that arbitrary two-dimensional patterns can be generated. The project is jointly funded by the Divisions of Physics and Materials Research in the Mathematical and Physical Sciences Directorate.