MRI: Acquisition of Thin Film Low Pressure Chemical-Vapor Deposition (LPCVD) and Patterning Equipment

该主要研究仪器（MRI）奖为两个系统的采购提供资金：(i)用于正面和背面掩模对准的光刻设备，以及（ii）用于薄膜形成的低压化学气相沉积堆栈。掩模对准和曝光系统用于对准在衬底正面或背面依次形成的薄膜中的制造特征，以实现完整的微器件。这种工艺允许制造传感器和执行器以及集成电路等设备，横向尺寸约为几微米。沉积堆用于沉积多晶硅、低应力氮化硅、低温二氧化硅、磷硅酸盐玻璃等薄膜。这些是在微机电系统（MEMS）技术中最常用的硅基薄膜。该设备将被学生和研究人员用于制造和表征集成电（晶体管）、机械（光束）、光学（波导）、热（加热器）、生物（蛋白质）和化学成分在单个芯片上的完整微系统。购买这些系统是亚利桑那大学长期计划的重要组成部分，该计划旨在建立最先进的微/纳米制造设施，以支持其跨学科的教学和研究项目。校园内的设施将允许来自科学、工程和医学等不同学科的研究人员开发新的微器件，这些器件需要选择性修饰和光刻定义的表面特性，特别是在纳米生物微系统领域产生独特的协同作用。该设施将支持半导体加工、器件制造、微机械加工和纳米科学与技术领域的本科生和研究生的教育。在快速发展的技术环境中，用最先进的设备和技术培养新一代工程师和研究人员势在必行。此外，该设施将对西南地区大量高科技公司利用先进半导体加工技术进行的产品开发产生重大影响。

This Major Research Instrumentation (MRI) award provides funds for the acquisition of two systems: (i) photolithographic equipment for front- and back-side mask alignment, and (ii) Low Pressure Chemical-Vapor Deposition stack for thin film formation. The mask alignment and exposure system is used to align fabricated features in thin films sequentially formed either on the front side or the back side of a substrate to realize a complete microdevice. This is the process that allows the manufacturing of devices such as sensors and actuators, as well as integrated circuits, about a few micrometers in lateral dimensions. The deposition stack is used to for the deposition of thin films such as polycrystalline silicon, low-stress silicon nitride, low-temperature silicon dioxide and phosphosilicate glass. These are the most commonly used silicon-based thin films in MicroElectroMechanical Systems (MEMS) technology. This equipment will be used by both students and researchers to fabricate and characterize complete microsystems integrating electrical (transistors), mechanical (beams), optical (wave-guides), thermal (heaters), biological (proteins) and chemical components on a single chip.The acquisition of these systems is an essential component of the long-term plan of the University of Arizona to set-up a state-of-the-art micro/nano fabrication facility in support of its interdisciplinary teaching and research programs. The on-campus facility will allow researchers from various academic disciplines such as science, engineering and medicine to develop novel microdevices requiring selectively modified and photolithographically defined surface properties leading, particularly, to a unique synergy in the field of nano-bio-micro systems. The facility will support the education of under-graduate and graduate students in the areas of semiconductor processing, device manufacturing, micromachining, and nano science and technology. In the fast evolving technological scene, it is imperative to train the new generation of engineers and researchers with the most advanced equipment and techniques. Moreover, the facility will make a significant impact on product development being conducted by a large number of high-tech companies in the Southwest utilizing advanced semiconductor processing.