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Synthesis and characterization of erbium doped metal oxide photonic materials for optoelectronics application

Synthesis and characterization of erbium doped metal oxide photonic materials for optoelectronics application
光电子应用中掺铒金属氧化物光子材料的合成与表征
批准号:
0522534
负责人:
Jane Chang
金额:
$0.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2005
资助国家:
美国
项目状态:
已结题
起止时间:
2005-06-01 至 2010-11-30

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中文摘要
翻译
研究机构:加州大学洛杉矶分校提案编号:0522534题目:用于光电子应用的掺铒金属氧化物光子材料的合成和表征本研究项目涉及使用-二酮酸前体的原子层沉积(ALD)工艺合成掺铒金属氧化物薄膜,以实现高浓度光学活性铒离子的掺入,同时最小化离子-离子簇/相互作用并保持铒的三价态。具体而言,该项目旨在研究ALD过程中导致Er3+可控掺杂的反应动力学,利用最先进的表面分析技术来阐明铒的化学配位和电荷状态随铒浓度的变化,测量铒离子的光致发光和吸收截面,并将合成的掺铒材料集成到微纳米尺度波导中以测试光学性能。这项工作的成功将为合成光学可行的掺铒金属氧化物薄膜提供优化的工艺,并为未来几代更高效的光电器件奠定基础。广泛影响:更广泛的影响是通过工程课程和实践研究对研究生、本科生和高中暑期实习生的教育和培训。研究成果将整合到PI开发的两门课程中,以最大限度地发挥研究的影响,包括半导体制造的本科实验课程和表面与界面工程的研究生/本科生课程。本项目将资助女研究生攻读博士学位。高级研究项目和暑期职位将提供给本科生,特别是女性,从事光谱数据收集和分析,以帮助他们在学术界或工业界的长期职业发展。此外,为了培养女高中生进入大学后对理工科的兴趣,将通过公团开展的宣传活动,向她们提供暑期实习机会。
英文摘要
ABSTRACTPI: Jane P. Chang Institution: University of California - Los AngelesProposal Number: 0522534Title: Synthesis and Characterization of Erbium-Doped Metal Oxide Photonic Materials for Optoelectronics ApplicationsThis research project involves the synthesis of erbium doped metal oxide thin films using an atomic layer deposition (ALD) process with -diketonate precursors to enable the incorporation of a high concentration of optically active erbium ions, while minimizing ion-ion clustering/interactions and maintaining the trivalent state of erbium. Specifically, it aims to study the reaction kinetics in an ALD process leading to a controlled doping of Er3+, implement state-of-the-art surface analytical techniques to elucidate chemical coordination and charge state of erbium as a function of erbium concentration, measure the photoluminescence and determine the absorption cross section for erbium ions, and integrate the synthesized erbium doped materials into micro- to nanometer scaled waveguides to test the optical performance. The success of this work will provide optimized processes for synthesizing optically viable erbium doped metal oxide thin films, and lay the foundation of future generations of more efficient optoelectronic devices.Broad Impact:The broader impact is in the education and training of graduate, undergraduate, and high school summer intern students through engineering courses and hands-on research. Research outcome will be integrated into two courses developed by the PI to maximize the impact of the research, including an undergraduate laboratory course on Semiconductor Manufacturing and a graduate/undergraduate course on Surface and Interface Engineering. Female graduate students will be supported under this program to pursue Ph.D. studies. Senior research projects and summer positions will be offered to undergraduate students, especially women, to work on spectroscopic data collection and analysis to help their long-term career development in academia or industry. Summer internships will also be offered to female high school students through the outreach activities established by the PI to promote their interest in pursuing Science and Engineering when they enter college.
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Atomic layer etching through controlled surface chemistry
Plasma Processing Science: Many Scales, Many Applications, One discipline to be held July 27-August 1, 2014 at Bryant University, Smithville, RI
  • 批准号:
    1418537
  • 项目类别:
    Standard Grant
  • 资助金额:
    $1.0万
  • 财政年份:
    2014
  • 负责人:
    Jane Chang
  • 依托单位:
2012 Plasma Processing Science GRC & GRS, July 22-27, 2012, at Bryant University, Smithfield, RI
  • 批准号:
    1202232
  • 项目类别:
    Standard Grant
  • 资助金额:
    $1.0万
  • 财政年份:
    2012
  • 负责人:
    Jane Chang
  • 依托单位:
Engineering Infrastructure Renovation for Sustainability Research
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