Plasma Enhanced Atomic Layer Deposition: Materials Synthesis and Plasms-Surface Chemistry

等离子体增强原子层沉积:材料合成和等离子体表面化学

基本信息

  • 批准号:
    0317449
  • 负责人:
  • 金额:
    $ 36.02万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Continuing Grant
  • 财政年份:
    2003
  • 资助国家:
    美国
  • 起止时间:
    2003-07-15 至 2007-06-30
  • 项目状态:
    已结题

项目摘要

Novel electronic materials of nanometer thicknesses are greatly needed for improved performance in a variety of technologically advanced fields including microelectronics, optoelectronics, photonics, and chemical sensors. The leap into controlling thin film quality and composition at an atomic scale requires a novel process and a fundamental understanding of the surface reaction chemistry. This proposal focuses on developing an atomic layer deposition process using a partially ionized gas chemistry, implementing state-of-the-art surface analytical techniques to characterize the surface reactions, and integrating these materials into microelectronic devices to test the electronic performance. The success of this research will provide optimized processing of depositing ultra-thin electronic materials, and lay the foundation of future generations of faster microelectronic devices. Research outcome will be integrated into three courses developed by the principle investigator at UCLA to maximize the impact of the research, i.e., an undergraduate course entitled Semiconductor Manufacturing Laboratory, a graduate/undergraduate course on Surface and Interface Engineering, and a graduate course on Principles of Plasma Processing. Two female graduate students in the Department of Chemical Engineering will be supported under this program to pursue their Ph.D. studies. Senior research projects and summer positions will be offered to undergraduate students at UCLA, especially women, to work on spectroscopic data collection and analysis outlined in the proposed research and to help their long term career development in academia or industry. Summer internships will also be offered to high school girls through the outreach activities established by the principle investigator to promote the interest of female students in pursuing Science and Engineering when they enter colleges.
在包括微电子学、光电子学、光电子学和化学传感器在内的各种技术先进领域,迫切需要纳米厚度的新型电子材料来提高性能。在原子尺度上控制薄膜质量和成分的飞跃需要一种新的工艺和对表面反应化学的基本了解。这项提议的重点是开发一种使用部分电离气体化学的原子层沉积工艺,实施最先进的表面分析技术来表征表面反应,并将这些材料集成到微电子设备中以测试电子性能。这项研究的成功将为超薄电子材料的沉积提供优化的工艺,并为下一代更快的微电子器件奠定基础。研究成果将被整合到加州大学洛杉矶分校首席研究员开发的三门课程中,以最大限度地发挥研究的影响,即名为半导体制造实验室的本科生课程,表面和界面工程研究生/本科生课程,以及等离子加工原理研究生课程。化学工程系的两名女研究生将在这项计划下获得资助,继续攻读博士学位。加州大学洛杉矶分校将为本科生,特别是女性,提供高级研究项目和暑期职位,让他们从事拟议研究中概述的光谱数据收集和分析工作,并帮助他们在学术界或行业的长期职业发展。还将通过首席调查员建立的外联活动向高中女生提供暑期实习机会,以促进女学生进入大学后对攻读理工科的兴趣。

项目成果

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会议论文数量(0)
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Jane Chang其他文献

Entrepreneurship students use of causation, effectuation and bricolage in a microcosm
创业学生在微观世界中运用因果关系、效果和拼凑
  • DOI:
    10.5465/ambpp.2017.15077abstract
  • 发表时间:
    2017
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Alison Rieple;Jane Chang
  • 通讯作者:
    Jane Chang
113. Understanding the Relationship Between Adverse Childhood Experiences and Depression in Adolescents: A Pilot Study
  • DOI:
    10.1016/j.jadohealth.2022.01.208
  • 发表时间:
    2022-04-01
  • 期刊:
  • 影响因子:
  • 作者:
    Tatiana Ndjatou;Yuqing Qiu;Linda Gerber;Jane Chang
  • 通讯作者:
    Jane Chang
“H..P…What?” HPV vaccine misconceptions among parents and adolescents in a diverse clinic population: Why are we missing the mark with early vaccination? (2140)
“人乳头瘤病毒……什么?”在不同诊所人群中父母和青少年对人乳头瘤病毒疫苗的误解:为什么我们在早期接种方面没有达到目标?(2140)
  • DOI:
    10.1016/j.ygyno.2023.06.265
  • 发表时间:
    2023-09-01
  • 期刊:
  • 影响因子:
    4.100
  • 作者:
    Muhammad Danyal Ahsan;Emily Webster;Amita Kulkarni;Corbyn Nchako;Emilio Peñate;Shanice Beaumont;Xiaoyue Ma;Melanie Wilson-Taylor;Jane Chang;Lisa Ipp;Monika Safford;Evelyn Cantillo;Melissa Frey;Kevin Holcomb;Eloise Chapman-Davis
  • 通讯作者:
    Eloise Chapman-Davis
Battling HPV misinformation to improve vaccination: The use of a novel patient activated learning system (PALS) among university students (2169)
与 HPV 错误信息作斗争以提高疫苗接种率:在大学生(2169 名)中使用一种新颖的患者激活学习系统(PALS)
  • DOI:
    10.1016/j.ygyno.2023.06.291
  • 发表时间:
    2023-09-01
  • 期刊:
  • 影响因子:
    4.100
  • 作者:
    Corbyn Nchako;Emilio Peñate;Amelia Greiner Safi;Muhammad Danyal Ahsan;Amita Kulkarni;Emily Webster;Meghan Witherow;Xiaoyue Ma;Evelyn Cantillo;Melissa Frey;Kevin Holcomb;Melanie Wilson-Taylor;Jane Chang;Lisa Ipp;Eloise Chapman-Davis
  • 通讯作者:
    Eloise Chapman-Davis
E-Cigarette Warning Labels to Prevent Adolescent Use: A Letter Response.
防止青少年使用电子烟的警告标签:一封信函回应。

Jane Chang的其他文献

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{{ truncateString('Jane Chang', 18)}}的其他基金

Atomic layer etching through controlled surface chemistry
通过受控表面化学进行原子层蚀刻
  • 批准号:
    1805112
  • 财政年份:
    2018
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
Plasma Processing Science: Many Scales, Many Applications, One discipline to be held July 27-August 1, 2014 at Bryant University, Smithville, RI
等离子体处理科学:多种尺度、多种应用、一门学科将于 2014 年 7 月 27 日至 8 月 1 日在罗德岛州史密斯维尔布莱恩特大学举行
  • 批准号:
    1418537
  • 财政年份:
    2014
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
2012 Plasma Processing Science GRC & GRS, July 22-27, 2012, at Bryant University, Smithfield, RI
2012年等离子体加工科学GRC
  • 批准号:
    1202232
  • 财政年份:
    2012
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
Engineering Infrastructure Renovation for Sustainability Research
可持续发展研究的工程基础设施改造
  • 批准号:
    0963183
  • 财政年份:
    2010
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
Engineering Electrolyte Materials in Energy Storage Devices
储能装置中的工程电解质材料
  • 批准号:
    0932761
  • 财政年份:
    2009
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Continuing Grant
Engineering Crystalline Oxides on Wide Band Gap Semiconductors
宽带隙半导体上的工程晶体氧化物
  • 批准号:
    0801996
  • 财政年份:
    2008
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
Synthesis of Multifunctional Metal Oxides by Radical Enhanced Atomic Layer Deposition
自由基增强原子层沉积合成多官能金属氧化物
  • 批准号:
    0758263
  • 财政年份:
    2008
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
Synthesis and characterization of erbium doped metal oxide photonic materials for optoelectronics application
光电子应用中掺铒金属氧化物光子材料的合成与表征
  • 批准号:
    0522534
  • 财政年份:
    2005
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
Design and Integration of a Cylindrical Ion Trap Array for a Micro-Total-Chemical-Analysis System
用于微型全化学分析系统的圆柱形离子阱阵列的设计和集成
  • 批准号:
    0329829
  • 财政年份:
    2003
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant
Design and Integration of a Cylindrical Ion Trap Array for a Micro-Total-Chemical-Analysis System
用于微型全化学分析系统的圆柱形离子阱阵列的设计和集成
  • 批准号:
    0230191
  • 财政年份:
    2002
  • 资助金额:
    $ 36.02万
  • 项目类别:
    Standard Grant

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Plasma-surface interaction in plasma-enhanced atomic-layer deposition of two-dimensional materials
二维材料等离子体增强原子层沉积中的等离子体-表面相互作用
  • 批准号:
    23KF0049
  • 财政年份:
    2023
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MRI: Acquisition of Plasma Enhanced Atomic Layer Deposition (PEALD) for Extremely Conformal Deposition of Metal and Nitride Films on 3D-Nanostructure Devices
MRI:获取等离子体增强原子层沉积 (PEALD),以在 3D 纳米结构器件上极其保形地沉积金属和氮化物薄膜
  • 批准号:
    1919896
  • 财政年份:
    2019
  • 资助金额:
    $ 36.02万
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GOALI: Ultra-Low Wear Plasma Enhanced Atomic Layer Deposited Nitride Thin Films: Exploring Processing, Structure, Properties and Mechanisms
GOALI:超低磨损等离子体增强原子层沉积氮化物薄膜:探索加工、结构、性能和机制
  • 批准号:
    1826251
  • 财政年份:
    2019
  • 资助金额:
    $ 36.02万
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    Standard Grant
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具有原位光谱椭圆计的等离子体增强原子层沉积系统
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  • 财政年份:
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Surface reaction mechanisms for plasma enhanced atomic layer etching process by organic compounds
有机化合物等离子体增强原子层刻蚀工艺的表面反应机制
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    18K13532
  • 财政年份:
    2018
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Plasma-Enhanced Atomic Layer Deposition of Copper Metal
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    Alexander Graham Bell Canada Graduate Scholarships - Doctoral
EAGER Real-D: Real-time Data-Based Modeling and Control of Plasma-Enhanced Atomic Layer Deposition
EAGER Real-D:等离子体增强原子层沉积的基于数据的实时建模和控制
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Plasma-Enhanced Atomic Layer Deposition of Copper Metal
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  • 批准号:
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铜金属的等离子体增强原子层沉积
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  • 资助金额:
    $ 36.02万
  • 项目类别:
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Plasma-Enhanced Atomic-Layer-Deposition Anlage
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