Achieving Molecular Level Control over the Chemical, Electrochemical, and Electrical Properties of Crystalline Si Surfaces

化学系的分析和表面化学（ASC）项目将支持加州理工学院Nathan Lewis教授的研究项目。刘易斯教授和他的学生将研究如何获得涉及硅表面修饰过程的分子控制。硅表面的化学修饰在许多应用中都很重要，包括将分子电子学连接到硅基电路，开发新型化学传感器，开发新的集成光电器件，从现有的光伏和光电化学电池中获得更高的效率，以及实现由廉价但高表面积材料构建的新型器件的高效率。这项研究将涉及一系列广泛的实验，旨在回答硅表面化学的基本问题，同时展示硅表面的新化学性质。刘易斯教授的研究将为学生和博士后研究人员提供优秀的培训机会，在一个高度跨学科的前沿科学研究领域。

The Analytical and Surface Chemistry (ASC) program of the Division of Chemistry will support the research program of Prof. Nathan Lewis of California Institute of Technology. Prof. Lewis and his students will investigate how to gain molecular control of processes involving the modification of silicon surfaces. Chemical modification of silicon surfaces is important in a plethora of applications including interfacing molecular electronics to Si-based circuitry, developing novel chemical sensors, developing new integrated optoelectronic devices, obtaining higher efficiencies from existing photovoltaic and photoelectrochemical cells and enabling high efficiencies of novel devices constructed from inexpensive but high surface area materials. The study will involve an extensive series of experiments designed to answer fundamental questions in silicon surface chemistry while demonstrating new chemical properties of Si surfaces. The research of Prof. Lewis will provide excellent training opportunities for students and postdoctoral research associates in a highly multidisciplinary area at the forefront of scientific research.