NSEC: Center for High-rate Nanomanufacturing
NSEC: Center for High-rate Nanomanufacturing
批准号:
0832785
负责人:
Ahmed Busnaina
金额:
$245.0万
依托单位:
依托单位国家:
美国
项目类别:
Cooperative Agreement
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-09-01 至 2015-05-31
中文摘要
3.项目摘要要将纳米科学的突破转化为新技术,我们需要了解并克服纳米制造的障碍。在应对NNI的重大挑战和在NSF纳米制造研讨会上发现的许多障碍中,CHN确定了以下关键问题,这些问题定义了纳米制造的基本技术障碍:1.我们如何组装不同的纳米级元素?导致纳米级结构组装和定向的机制是什么?我们如何控制这些机制?2.我们如何以连续或高速的方式扩大组装过程?我们如何控制高速组装、分离和转移纳米元素所需的界面行为和力?3.我们如何测试纳米结构的可靠性?我们如何检测和减少缺陷?4.纳米制造过程如何满足现有和未来的环境和健康法规?CHN正在开发克服这些根本障碍的过程和工具,由三所大学组成的协同团队:波士顿东北大学、马萨诸塞大学洛厄尔分校和达勒姆新汉普郡大学。这些平等的合作伙伴组成了高速纳米制造中心(CHN)。这项正在进行的合作表明,这种有效而独特的合作伙伴关系,结合了39名具有不同专业知识的工程师、物理学家、化学家、材料科学家、商业和人文研究人员的技能,有能力解决这些关键障碍。目标高速率纳米制造中心的目标是:1.了解纳米级合成和控制的基本原理,以实现纳米元素的高速率/大容量自下而上、精确定向组装2。将纳米科学转化为在能源、生物医学、电子和材料方面的实际应用。通过识别和管理纳米技术的潜在风险来发展负责任的制造4。培养当前和新兴的纳米制造劳动力。计划CHN?S纳米制造过程的方法是完全整合的。CHN在推进我们对高速率/大批量纳米制造的愿景方面取得了重大进展。这一愿景包括纳米元素的合成和/或功能化;使用模板进行定向组装;转移组装的结构;将组装的结构整合到试验台和新兴应用中。与负责任的制造和包括建模、可靠性和缺陷缓解在内的交叉研究相结合,上述障碍定义了CHN的研究推动力:推力1:合成纳米元素并创建多功能纳米模板推力2:使用纳米模板实现高速/大批量制造信任3:概念验证试验台、新兴应用和制造就绪推动力4:同时评估纳米制造对环境、经济、监管和伦理的影响CHN正在定义和开发高速纳米制造过程,以实现:大面积一致的纳米级定向组装(以英寸或英尺为单位)、快速纳米级组装(以分钟或秒为单位)、大量纳米元素的组装这里显示的CHN流程图说明了不同的研究推力和任务是如何联系在一起的,从纳米元素和纳米模板开始(推力1),继续到它们的组装和转移(推力2),然后到实现试验台和应用(推力3),所有这些都是在评估环境和经济影响(推力4)的同时进行的。该流程图说明了CHN的高度集成性质,并显示了系统级的重点如何推动研究从发现到概念验证试验台。它还展示了如何使用多尺度建模来理解和指导综合、装配和转移中的基本机构。
英文摘要
3. Project SummaryTransferring breakthroughs in nanoscale science into new technologies requires that we understand and overcome barriers to nanoscale manufacturing. In addressing the NNI Grand Challenges and the many hurdles identified at NSF Workshops on Nanomanufacturing, CHN has identified the following criticalquestions, which define the fundamental technical barriers to nanomanufacturing:1. How can we assemble different nano-scale elements? What are the mechanisms leading to the assembly and orientation of nanoscale structures? How do we control these mechanisms?2. How can we scale up assembly processes in a continuous or high rate manner? How do we control the interfacial behavior and forces required to assemble, detach, and transfer nanoelements at high rates?3. How can we test for reliability in nanostructures? How can we detect and mitigate defects?4. How can nanomanufacturing processes meet existing and future environmental and health regulations?The CHN is developing the processes and tools to overcome these fundamental barriers, with a synergistic team of three universities: Northeastern University, Boston; University of MassachusettsLowell; and University of New Hampshire, Durham. These equal partners form the Center for High-rate Nanomanufacturing (CHN). This ongoing collaborative effort has demonstrated that this effective and unique partnership, combining the skills of 39 engineers, physicists, chemists, material scientists, businessand humanities investigators with diverse expertise has the capacity to tackle these critical barriers.GoalsThe Center for High-rate Nanomanufacturing goals are:1. Understand the fundamentals of synthesis and control at the nanoscale to enable high-rate/highvolume bottom-up, precise directed assembly of nanoelements2. Translate nanoscale science to practical applications in energy, biomedical, electronics and materials.3. Develop responsible manufacturing by identifying and managing potential risks of nanotechnology4. Educate the current and emerging nanomanufacturing workforce.ProgramsThe CHN?s approach to nanomanufacturing processes is fully integrated. The CHN has made major strides to advance our vision for High-rate/high-volume nanomanufacturing. This vision includes synthesis and/or functionalization of nanoelements ; uses templates for directed assembly ; transfers assembled structures ; integrates assembled structures into test beds and emerging applications. Combined with responsible manufacturing, and cross-cutting research including modeling, reliability, and defect mitigation, the above barriers define the CHN research thrusts:Thrust 1: Synthesize nanoelements and create versatile nanotemplatesThrust 2: Employ nanotemplates to enable high-rate/high-volume manufacturingThrust 3: Proof of Concept Test Beds, Emerging Applications, and Manufacturing ReadinessThrust 4: Concurrently assess the environmental, economic, regulatory, and ethical impacts of nanomanufacturingThe CHN is defining and developing high-rate nanomanufacturing processes that will enable: Consistent nanoscale directed assembly over large areas (measured in inches or feet), fast nanoscale directed assembly (measured in minutes or seconds), assembly of a large volume of nanoelements, repeatable andhigh yield assembly processes, and assembly of reliable structures.The CHN process flow chart shown here illustrates how the different research thrusts and tasks are connected starting with nanoelements and nanotemplates (Thrust 1), continuing to their assembly and transfer (Thrust 2) and then on to the realization of test beds and applications (Thrust 3), all whileevaluating environmental and economic impacts (Thrust 4). The flow chart illustrates the highly integrated nature of CHN and also shows how a system-level focus drives the research from discovery through proof-of-concept test beds. It also shows how-multi scale modeling is used to understand and guide fundamental mechanisms in synthesis, assembly and transfer.
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批准号:1543056
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项目类别:Standard Grant
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资助金额:$19.87万
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资助金额:$5.0万
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NSEC: The Center for High-rate Nanomanufacturing (CHN)
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批准号:0425826
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项目类别:Cooperative Agreement
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资助金额:$0.0万
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财政年份:2004
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负责人:Ahmed Busnaina
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依托单位:
New England 1st Nanomanufacturing Workshop
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批准号:0331941
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项目类别:Standard Grant
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资助金额:$0.6万
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财政年份:2003
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负责人:Ahmed Busnaina
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依托单位:
Establishing an I/UCRC Center Site for Microcontamination Control at Northeastern University
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批准号:0225178
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项目类别:Continuing Grant
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资助金额:$25.0万
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财政年份:2002
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负责人:Ahmed Busnaina
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依托单位:
Workshop: Three Dimensional Nanomanufacturing- An Industry Perspective; January 5-6, 2003, Birmingham, AL
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批准号:0237650
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项目类别:Standard Grant
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资助金额:$5.57万
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财政年份:2002
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负责人:Ahmed Busnaina
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依托单位:
U.S.-Korea Cooperative Research: Study of the Interaction Between Slurry Particles and Wafer Surfaces for Post-Chemical Mechanical Polishing Processes
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批准号:0140529
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项目类别:Standard Grant
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资助金额:$2.43万
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财政年份:2002
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负责人:Ahmed Busnaina
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依托单位:
Establishing an IUCRC Center for Microcontamination Control at Northeastern University: a Planning Meeting Proposal
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批准号:0120755
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项目类别:Standard Grant
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资助金额:$1.0万
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财政年份:2001
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负责人:Ahmed Busnaina
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依托单位:
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