Basic research on the shape memory alloy thin films
Basic research on the shape memory alloy thin films
批准号:
05452272
负责人:
MIYAZAKI Shuichi
金额:
$3.65万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1994
中文摘要
在几种用于制造微机械驱动器的性能材料中,Ti-Ni形状记忆合金薄膜具有变形大、恢复力大等优点,而且即使是形状记忆合金固有的缺点,如由于冷却速度的限制,也可以在薄膜中得到很大的改善。因此,发展钛镍形状记忆合金薄膜已成为迫切需要。本项目已成功地在溅射沉积的Ti-Ni薄膜中实现了完美的形状记忆效应。研究发现,热处理、合金成分和溅射条件对相变温度和形状记忆特性有很大影响。用溅射法制备了Ti-Ni-Cu和Ti-Ni-Pd三元形状记忆合金薄膜,其马氏体相变的形状变化率和恢复力分别达到6%和500 Mpa,与块体样品相当。它们分别表现出较小的温度滞后和较高的相变温度,这些特性有效地实现了高响应的致动器特性。Ti-Ni-Pd薄膜在冷却和加热过程中表现出与Ti-Ni二元合金薄膜相似的单相变。相应地,它们在冷却和加热时都表现出单级变形。Ti-Ni-Cu薄膜表现出两阶段相变,即两阶段变形,第一阶段对应于B2与O(正交)相之间的转变,第二阶段对应于O相与M相之间的转变。第一阶段相变伴随着一个小的温度滞后。所有这些薄膜都表现出了完美的形状记忆效应。
英文摘要
Among several types of performance materials proposed for fabricating microactuators to power micromachines, Ti-Ni shape memory alloy thin films have great advantages such as large deformation and recovery force ; besides, even an intrinsic disadvantage of the shape memory alloy such as a slow response due to the limitation of cooling rate can be greatly improved in thin films. Therefore, the development of Ti-Ni shape memory alloy thin films has been keenly demanded. The present project has been successful in developing a perfect shape memory effect in sputter-deposited Ti-Ni thin films. The transformation temperatures and shape memory characteristics were found to be strongly affected by heat-treatment, alloy composition and sputtering condition. The shape change and recovery force associated with the martensitic transformation in Ti-Ni thin films reached up to 6% and 500Mpa, respectively, which were equivalent to those of bulk specimens.Ti-Ni-Cu and Ti-Ni-Pd ternary shape memory alloy thin films were also made by sputtering. They showed a small temperature hysteresis and high transformation temperatures, respectively ; these characteristics are effective to achieve a high response actuator characteristic. The Ti-Ni-Pd thin film showed a single stage transformation upon cooling and heating similarly to a Ti-Ni binary alloy thin films. Corresponding, they showed a single stage deformation both upon cooling and heating. The Ti-Ni-Cu thin film showed a two-stage transformation and hence a two-stage deformation ; the first stage corresponds to the transformation between B2 and O(Orthorhombic)-phase and the second stage between the O- and M-phases. The first stage transformation was accompanied by a small temperature hysteresis. All these thin films showed perfect shape memory effect.
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S.Miyazaki他: "Shape Memory Characteristics of Sputter-deposited Ti-Ni Thin Films" Materials Transaction JIM. 34. 14-19 (1994)
S. Miyazaki 等人:“溅射沉积 Ti-Ni 薄膜的形状记忆特性”Materials Transaction JIM。34. 14-19 (1994)
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K.Nomura他: "Transformation and Deformation Behavior of Sputter-deposited Ti-Ni Thin Films" Trans.Mater.Res.Soc.Jpn.18B. 1049-1052 (1994)
K. Nomura 等人:“溅射沉积 Ti-Ni 薄膜的转变和变形行为”Trans.Mater.Res.Soc.Jpn.18B (1994)。
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S.Miyazaki他: "Effect of Heat Treatment on Deformation Behavior Associated with R-phase and Martensitic Transformations in Ti-Ni Thin Films" Trans.Mater.Res.Sco.Jpn.18B. 1041-1044 (1994)
S. Miyazaki 等人:“热处理对 Ti-Ni 薄膜中与 R 相和马氏体转变相关的变形行为的影响”Trans.Mater.Res.Sco.Jpn.18B (1994)。
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M.Satoh, A.Ishida, A.Takei and S.Miyazaki: "Effect of Thermal Cycling on the Transformation Temperatures of Ti-Ni Shape Memory Alloy Thin Films" Surface Technology. 45. 1308-1309 (1994)
M.Satoh、A.Ishida、A.Takei 和 S.Miyazaki:“热循环对钛镍形状记忆合金薄膜转变温度的影响”表面技术。
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S.Miyazaki 他: "Shape Memory Characteristics of Sputter-deposited Ti-Ni-base Thin Films" Proc.of 1995 North American Conf.on Smart Strict.and Materials.(印刷中). (1995)
S. Miyazaki 等人:“溅射沉积钛镍基薄膜的形状记忆特性”Proc.of 1995 North American Conf.on Smart Strict.and Materials(正在出版)。
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