Nanoimprint Lithography System

我们提出了一个纳米压印光刻系统（UV-NIL）作为一个模块化的纳米生产设施的三个主要组成部分之一。UV-NIL系统是精确和快速实现和复制2D和2.5D微米和纳米结构所必需的。该系统将能够显著提高这种结构的生产效率，并实现高产量和灵活性。特别是，它将与基于双光子聚合（TPP）的激光纳米加工系统结合使用，该系统将制造用于随后通过UV-NIL进行微米和纳米结构复制的母模，从而实现最大的生产灵活性。在模块化纳米生产设施内，用于实现2D，2.5D和3D微米和纳米结构的纳米压印光刻系统和激光纳米加工系统将由光学计量系统补充，用于精确测量相关参数，如结构几何形状，尺寸，特征尺寸和表面粗糙度。所有模块将在多规模生产链中实施，以实现各种集成光学元件，子系统，和整个功能系统的各种应用，从光学网络的监测和传感成像和超材料。拟议的纳米压印光刻系统（UV-NIL）-并最终模块化纳米生产设施-提供了一个组合的生产和表征环境，并将广泛使用的四个主要用户和一些额外的合作者的群体。它将设在一个共同的基础设施中，以实现最佳的访问和操作。申请人的一个研究小组将组织运行和服务。所申请的系统目前在计划用户组中不可用。

We propose a Nanoimprint Lithography System (UV-NIL) as one of three main components of a modular Nanoproduction Facility. The UV-NIL System is required for precise and fast realization and replication of 2D and 2.5D micro- and nanostructures. The system will make it possible to significantly increase the production efficiency of such structures and achieve high throughput and flexibility. In particular, it will be utilized in combination with a Laser Nanofabrication System based on two-photon polymerization (TPP) which will fabricate the master tools for the subsequent micro- and nanostructure replication by UV-NIL enabling maximal production flexibility. Within the modular Nanoproduction Facility, the Nanoimprint Lithography System and the Laser Nanofabrication System for the realization of 2D, 2.5D, and 3D micro- and nanostructures will be complemented by an Optical Metrology System for precise measurement of the relevant parameters such as structure geometries, dimensions, feature sizes, and surface roughness. All modules will be implemented in a multi-scale production chain for the realization of various integrated optical elements, subsystems, and entire functional systems for a variety of applications ranging from optical networks over monitoring and sensing to imaging and metamaterials.The proposed Nanoimprint Lithography System (UV-NIL) - and ultimately the modular Nanoproduction Facility - provides a combined production and characterization environment and will be broadly utilized by the groups of the four main users and a number of additional collaborators. It will be located in a common infrastructure for optimal access and operation. One research group of the applicants will organize operation and service.The requested system is currently not available in the groups of the planned users.