Plasma Enhanced Chemical Vapor Deposition

半导体技术研究所的研究活动包括半导体纳米结构的外延、芯片加工和集成到纳米计量系统中。该基础设施位于该研究所下属的外延竞争中心EC2。对于例如作为场效应晶体管的微LED结构的隔离层的电介质层的沉积，以及对于激光二极管的布拉格反射镜中的光学层的沉积，需要等离子体沉积系统。研究活动的重点将是结构微照明光引擎(SMILE)的微LED研究以及三维LED架构。此外，等离子体沉积将提供给Lena(“新兴纳米计量学实验室”)的所有合作伙伴，该实验室是布伦斯韦格州立大学新的纳米计量学研究中心。

The Institute of Semiconductor Technology is covering research activities from epitaxy of semiconductor nanostructures, chip processing and integration into systems for nanometrology. The infrastructure is available in the Epitaxy Competemce Center ec2, which is part of the institute. For the deposition of dielectric layers e.g. as isolation layers for microLED architectures of field effect transistors, as well as for optical layers in Bragg mirrors for laser diodes, a plasma deposition system is required. Focus of the reserach activities will be microLED reserach for Structured Micro Illumination Light Engines (SMILE) as well as 3-dimensional LED architectures. In addition, the plasma deposition will be available to all partner of LENA ("Laboratory for Emerging Nanometrology,"), the new reserach center for nanometrology reserach at TU Braunschweig.