Electron beam induced deposition and ablation nanofabrication facility

电子束诱导沉积与烧蚀(EBIDA)作为一种能够在几乎任何衬底上以非常高的精度制备三维纳米结构的新技术正在迅速崛起。这项提议旨在通过将专门的纳米光刻附件与现有最先进的1 nm分辨率高电流变压扫描电子显微镜相结合，建立一个纳米规模的EBIDA设施。这种仪器设备的组合将能够高速生产尺寸为1至10纳米的导电和绝缘结构。这一独特的设施将用于制造和制作新型纳米设备和结构的原型，并将能够测量它们的物理和化学性质。

Electron beam induced deposition and ablation(EBIDA) is rapidly emerging as a new technology capable of fabricating three-dimensional nanostructures on nearly any substrate with very high precision. This proposal aims to establish a nanoscale EBIDA facility by integrating a specialized nanolithography attachment with an existing state-of-the-art 1nm resolution high current variable pressure scanning electron microscope. This combination of instrumentation will enable the high-speed production of conductive and insulating structures with 1-to-10nm dimensions. The unique facility will be used to manufacture and prototype novel nanoscale devices and structures and will enable measurement of their physical and chemical properties.