Plasma-enhanced chemical vapor deposition tool

在微波技术与光子学研究所的无尘室里，几十年来半导体样品和微波元器件一直在成功生产。洁净区（黄灯区、湿化学、电镀）已于二零二一年完成翻新并重新投入使用。现在有些技术系统要更新。在本申请的范围内，应购买用于沉积各种氮化物，特别是氮化硅（SiN）、碳化硅（SiC）和氧化硅（SiO），也可能是混合物，以及非晶硅的等离子体激活化学气相沉积（PECVD）工具。层的张力应该是可调节的，这需要具有ICP（电感耦合等离子体）和RF发生器的系统。背景资料：达姆施塔特工业大学微波技术与光子学研究所（IMP）的洁净室目前拥有一个大约有18年历史的等离子体沉积系统。由于设备老化、需要定期维修且无法获得备件，应购买更换设备。旧设备的升级或现代化是不经济的。PECVD系统是洁净室技术的核心要素，是大多数加工工序所必需的，因此大量项目都依赖于该系统的功能。例如，抗反射涂层与系统一起沉积（光学和光子组件），绝缘体生长（光子和电子组件），微机械可调反射镜制造（微机械），低导热层用作温度调节元件的一部分。此外，用于蚀刻半导体材料的硬掩模可以用该系统沉积。该系统的主要负责人将是主申请人Sascha Preu。洁净室（包括PECVD）由电气工程和信息技术系的几个部门（FG）共同运营和使用，即FG微波技术（Jakoby），FG太赫兹组件和太赫兹系统（Preu）以及FG电子新材料（Meinert）。FG Integrated Micro-Nanosystems（布尔格）也支持和分享该技术。明确要求在电气工程部门之外共享使用。共同申请人Bernhard Urbaszek（混合量子系统，物理系，自2022年9月起）是这方面的第一个例子。

In the clean room of the Institute of Microwave Technology and Photonics, semiconductor samples and microwave components have been successfully produced for several decades. The cleanroom area (yellow light area, wet chemistry, electroplating) was renovated and put back into operation in 2021. Now some technology systems are to be brought up to date. Within the scope of this application, a plasma-activated chemical vapor deposition (PECVD) tool for the deposition of various dielectrics, especially silicon nitride (SiN), silicon carbide (SiC) and silicon oxide (SiO), possibly also mixtures, as well as amorphous silicon shall be purchased. The tension of the layers should be adjustable, which requires a system with ICP (inductively coupled plasma) and RF generator. Background: The clean room of the Institute of Microwave Technology and Photonics (IMP) at TU Darmstadt currently has an approximately 18-year-old plasma deposition system. Due to its age, regularly necessary repairs and the unavailability of spare parts, a replacement device shall be purchased. An upgrade or modernization of the old equipment is uneconomical. The PECVD system is a core element of cleanroom technology and is required for most processing sequences, so that a large number of projects depend on the functionality of the system. For example, anti-reflection coatings are deposited with the system (optical and photonic components), insulators are grown (photonic and electronic components), micromechanically adjustable mirrors are manufactured (micromechanics), and layers with low heat conduction are used as part of temperature-regulating elements. Furthermore, hard masks for etching of semiconductor materials can be deposited with the system. The main person in charge for the system will be the main applicant, Sascha Preu. The cleanroom and including the PECVD is jointly operated and used by several departments (FG) of the Department of Electrical Engineering and Information Technology, namely FG Microwave Technology (Jakoby), FG Terahertz Components and Terahertz Systems (Preu) as well as the FG New Materials for Electronics (Meinert). The technology is also supported and shared by the FG Integrated Micro-Nanosystems (Burg). Shared use outside of electrical engineering department is explicitly desired. Co-applicant Bernhard Urbaszek (Hybrid Quantum Systems, Department of Physics, since September 2022) is a first example of this.