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Study on structural relaxation in silica glass

Study on structural relaxation in silica glass
石英玻璃结构弛豫的研究
批准号:
09640408
负责人:
IKUSHIMA Akira J.
金额:
$2.56万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998

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中文摘要
翻译
研究石英玻璃中的结构弛豫是开发具有高性能如超低损耗和抗紫外性能的石英玻璃的必要条件。二氧化硅玻璃结构简单,有利于玻璃化转变机理的研究。在这个项目中,我们试图在包括玻璃化转变温度在内的宽温度范围内测量二氧化硅玻璃的各种性质,并阐明了结构弛豫过程及其杂质效应如下:(1)OH或Cl增强了由粘性流动控制的α弛豫,并且还产生了亚弛豫过程。(2)he亚弛豫过程是杂质扩散引起的局部结构变化。(3)I抑制α-弛豫,与OH和Cl相反。根据这些结果,我们已经建立了通过杂质掺杂控制结构弛豫,并开发了以下高功能二氧化硅玻璃。(1)Na掺杂超低损耗玻璃(2)I掺杂超耐热玻璃(3)通过OH掺杂、紫外激光照射和热退火产生的超紫外玻璃
英文摘要
Investigations of structural relaxation in silica glass are necessary for developing silica glasses with high performances such as ultralow-loss and UV-proof properties. Silica glass is also advantageous for studying on glass transition mechanism because of its simple structure. In this project we tried to measure various properties of silica glasses over a wide-temperature range including the glass transition temperature, and have elucidated structural relaxation processes and their impurity effects as follows :(1)OH or Cl enhances the alpha-relaxation governed by viscous flow, and also generates a sub-relaxational process.(2)he sub-relaxational process is local structural change caused by impurity diffusion.(3)I restrains the alpha -relaxation, contrary to OH and Cl.From these results, we have established controlling the structural relaxation by impurity doping, and developed the following high-functional silica glasses.(1)Na-doped ultralow-loss glass(2)l-doped ultra-heat-proof glass(3)Ultra UV-proof glass created by OH doping, UV-laser irradiation, and thermal annealing
期刊论文(10)
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会议论文
K.Saito: "“Development of a Wide-temperature Range VUV&UV Phospectrometer and Its Applications to Silica Glass"" J.Non-Cryst.Solids,. in print. (1999)
K.Saito:“宽温范围真空紫外和紫外光分光计的开发及其在石英玻璃中的应用”,J.Non-Cryst.Solids,印刷版。
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通讯作者:
K.Saito, A.J.Ikushima, T.Ito, and A.Itoh: ""A New Method of Developing Ultralow-loss Glasses"" J.Appl.Phys.81. 7129-7134 (1997)
K.Saito、A.J.Ikushima、T.Ito 和 A.Itoh:““开发超低损耗玻璃的新方法””J.Appl.Phys.81。
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通讯作者:
K.Saito: "“A New Method of Developing Ultralow-loss Glasses"" J.Appl.Phys.81. 7129-7134 (1997)
K.Saito:“开发超低损耗玻璃的新方法”,J.Appl.Phys.81 (1997)。
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K.Saito: "“Structural Relaxation of the Frozen-in Density Fluctuations in Silica Glass"" Prog.Theor.Phys.Suppl.126. 277-280 (1997)
K. Saito:“二氧化硅玻璃中冻结密度波动的结构弛豫”,Prog.Theor.Phys.Suppl.126 (1997)。
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共 9 条
    Development of silica glass for 157nm photolithography
    • 批准号:
      12355025
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $12.88万
    • 财政年份:
      2000
    • 负责人:
      IKUSHIMA Akira J.
    • 依托单位:
    Development of ultralow-loss glasses by controlling density fluctuations
    • 批准号:
      09355021
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $18.24万
    • 财政年份:
      1997
    • 负责人:
      IKUSHIMA Akira J.
    • 依托单位:
    海外基金